Rohm & Haas Electronic Materials LLC

Shipley Company LLC

Dow Global Technolgoies LLC

Other

Dupont Electronic Materials International, LLC

Suzanne M Coley

James F Cameron

Paul J LaBeaume

Shintaro Yamada

Li Cui

Vipul Jain

Owendi Ongayi

James W Thackeray

Anthony Zampini

Sheng Liu

Iou-Sheng Ke

Gerald B Wayton

Charlotte A Cutler

Peter Trefonas, Iii

Keren Zhang

Joshua A Kaitz

David A Valeri

Amy M Kwok

Tomoki Kurihara

Timothy G Adams

Daniel Greene

Francis J Timmers

David R Wilson

Mingqi Li

Cong Liu

George G Barclay

Edward K Pavelchek

Manuel doCanto

Ahmad E Madkour

Christopher P Sullivan

Cecilia W Kiarie

Bhooshan C Popere

Deyan Wang

Emad Aqad

Ashish A Pandya

William Williams, Iii

Christopher D Gilmore

Dana A Gronbeck

Zhibiao Mao

Chi Q Truong

Paul J Labeaume

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

Aromatic underlayer

An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic Caromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R, R; Rand Rare as provided herein; optionally, Rand Rcan be taken together form a 5- to 7-membered ring; optionally, one of Rto Rcan be taken together with Rto form a 5- to 7-membered ring; wherein Rand Roptionally may be taken together to form a 5- to 7-membered ring; wherein one of Ror Roptionally may be taken together with Rto form a 5- to 7-membered ring; and when X is O, Rand Rare absent.

Underlayer compositions and patterning methods

Coating compositions comprise: a curable compound comprising: a core chosen from a Ccarbocyclic aromatic ring, a Cheterocyclic aromatic ring, a Cfused carbocyclic aromatic ring system, a Cfused heterocyclic aromatic ring system, Caliphatic, and Ccycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.

Coating compositions and methods of forming electronic devices

A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic Caromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; Ris hydrogen, substituted or unsubstituted Calkyl, substituted or unsubstituted Cheteroalkyl, substituted or unsubstituted Ccycloalkyl, substituted or unsubstituted Cheterocycloalkyl, substituted or unsubstituted Calkenyl, substituted or unsubstituted Calkynyl, substituted or unsubstituted Caryl, substituted or unsubstituted Carylalkyl, substituted or unsubstituted Calkylaryl, substituted or unsubstituted Cheteroaryl, or substituted or unsubstituted Cheteroarylalkyl; and Ris substituted or unsubstituted Calkyl, substituted or unsubstituted Cheteroalkyl, substituted or unsubstituted Ccycloalkyl, substituted or unsubstituted Cheterocycloalkyl, substituted or unsubstituted Calkenyl, substituted or unsubstituted Calkynyl, substituted or unsubstituted Caryl, substituted or unsubstituted Carylalkyl, substituted or unsubstituted Calkylaryl, substituted or unsubstituted Cheteroaryl, or substituted or unsubstituted Cheteroarylalkyl, wherein Rand Rcan be optionally taken together to form a ring.

Coating composition for photoresist underlayer

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

Silicon-containing underlayers

Method using silicon-containing underlayers

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from &#x2212;5 to 13 and having pendently-bound siloxane moieties are provided.

Polyarylene resins and compositions containing them are useful as underlayers in semiconductor manufacturing processes.

Aromatic resins for underlayers

Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.

Silicon-based hardmask

Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Coating compositions for use with an overcoated photoresist

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.

Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si&#x2014;O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

Growing community of inventors

Mansfield, MA, United States of America

Suzanne M Coley