Toshiba Tungaloy Co., Ltd.

Susumu Yamaya

Tsutomu Mashimo

Shin-ichi Hirano

Hisashi Yamasaki

Minoru Nishida

The object of the present invention is to provide a stoichiometric B1-type tantalum nitride and a sintered body thereof. A B1-type tantalum nitride and a sintered body thereof, wherein a stoichiometric B1-type tantalum nitride is produced typically according to the method of impact compression, having the properties (a) that the X ray diffraction substantially shows a pattern ascribed to the stoichiometric B1-type tantalum nitride alone but not others, (b) that the measured value of the lattice spacing D (h, k, l) has a deviation of 0.00013 nm or less from the corresponding value calculated based on the B1 structure, (c) that the lattice constant is 0.4335.about.0.4338 nm, (d) that the electron diffraction image substantially shows the spots particular to the stoichiometric B1-type tantalum nitride alone but not others and (e) the value of Z in TaN.sub.z is within a range of 0.96-1.01.

Stoichiometric B1-type tantalum nitride and a sintered body thereof and

The object of the present invention is to provide a stoichiometric B1-type tantalum nitride and a sintered body thereof. A B1-type tantalum nitride and a sintered body thereof, wherein a stoichiometric B1-type tantalum nitride is produced typically according to the method of impact compression, having the properties (a) that the X-ray diffraction substantially shows a pattern ascribed to the stoichiometric B1-type tantalum nitride alone but not others, (b) that the measured value of the lattice spacing D (h, k, l) has a deviation of 0.00013 nm or less from the corresponding value calculated based on the B1 structure, (c) that the lattice constant is 0.4335.about.0.4338 nm, (d) that the electron diffraction image substantially shows the spots particular to the stoichiometric B1-type tantalum nitride alone but not others and (e) the value of Z in TaN.sub.z is within a range of 0.96-1.01.

There are disclosed a cubic boron nitride coated material including a substrate and an outer layer composed principally of cubic boron nitride and formed on a surface of the substrate, comprising an intermediate layer fored of at least one intermediate layer and interposed between the substrate and outer layer, the intermediate between the substrate and outer layer, the intermediate layer or the outermost one of intermediate layers being formed of a layer of at least one nitrogen-containing compound selected from the nitrides and nitroxides of Al, Ga, In and Tl and mutual solid solutions thereof, and a producing method of the same which comprises: providing, on the surface of the substrate, an intermediate layer formed of at least one intermediate layer, the intermediate layer or the outermost one of intermediate layers being formed of a layer of at least one nitrogen-containing compound selected from the group consisting of nitrides and nitroxides of Al, Ga, In and Tl and mutual solid solutions thereof; and causing the outer layer to undergo oriented growth on a face of the layer of the at least one nitrogen-containing compound, the face being densely packed with nitrogen atoms.

Method of producing cubic boron nitride coated material

A cubic boron nitride coated material comprises a substrate, an outer layer consisting essentially of cubic boron nitride and formed on a surface of the substrate, and at least one intermediate layer interposed between the substrate and outer layer, the intermediate layer comprising at least one nitrogen-containing compound selected from the nitrides and nitroxides of Al, Ga, In and Tl and mutual solid solutions thereof. Such a coated material can be produced by a method that comprises:

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Kawasaki, Japan

Susumu Yamaya