Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Susanne Markus

Stefan Dieckhoff

Udo Meyer

Marcel Sieben

Paul-Ludwig Michael Noeske

Christian Tornow

A device for testing the quality of microstructurization of a surface () having a known target microstructurization quality, comprising a radiation source () for coherent radiation, a first detector () and a second detector () and a masking system, all of which are set up and arranged with respect to one another so that radiation emitted by the radiation source () onto the surface () produces a diffraction pattern, wherein the diffraction maximum of order n of the diffraction pattern without the masking system would impinge on the first detector (), the masking system prevents 80% of the photons that are assigned to the diffraction maximum of order n from impinging on the first detector and the diffraction maximum of order a of the diffraction pattern impinges on the second detector (), wherein n is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a&#x2260;n.

Growing community of inventors

Bremen, Germany

Susanne Markus