Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Other

Susanne Beder

Wolfgang Singer

Alexander Epple

Aurelian Dodoc

Heiko Feldmann

Wilhelm Ulrich

Hans-Juergen Mann

Toralf Gruner

Karl-Heinz Schuster

Rudolf Von Buenau

David R Shafer

Michael Totzeck

Norbert Wabra

Daniel Kraehmer

Hans-Juergen Rostalski

Sascha Bleidistel

Helmut Beierl

Wilfried Clauss

Jochen Weber

Olaf Dittmann

Olaf Rogalsky

Baerbel Schwaer

Johannes Ruoff

Jochen Hetzler

Frank Schillke

Ari Kazi

Hubert Holderer

Bernhard Gellrich

Ulrich Loering

Hans-Jürgen Mann

Andreas Wurmbrand

Juergen Fischer

Ulrich Matejka

Christoph Menke

Alexander Wolf

Arif Kazi

Peter Klopfleisch

Jens Timo Neumann

Bernhard Kneer

Ralf Arnold

Andreas Dorsel

Karl Heinz Schuster

Andrea Berner

Bernd Dörband

Hans-Michael Stiepan

Joerg Mallmann

Albrecht Ranck

Ralf Müller

Gerhart Fuerter

Dave Shafer

André Dirauf

Rudolf Von BÜNAU

An optical system includes at least one optical element which has an optically effective surface and which is designed for an operating wavelength of less than 30 nm. The optical system also includes a heating arrangement for heating this optical element and comprising a plurality of IR emitters for irradiating the optically effective surface with IR radiation. The IR emitters are activatable and deactivatable independently of each other to variably set different heating profiles in the optical element. The optical system further includes at least one beam shaping unit for shaping the beam of the IR radiation steered onto the optically effective surface by the IR emitters. The optical system also includes a multi-fiber head comprising a multi-fiber connector for connecting optical fibers. IR radiation from a respective one of the IR emitters is suppliable by way of each of these optical fibers.

Optical system, heating arrangement, and method for heating an optical element in an optical system

An imaging optical unit includes a plurality of mirrors to guide imaging light along an imaging beam path. The plurality of mirrors includes a number of mirrors for grazing incidence (GI mirrors), which deflect a chief ray of a central object field point with an angle of incidence of more than 45&#xb0;. At least two of the GI mirrors are in the imaging beam path as basic GI mirrors so that the deflection effect thereof adds up for the chief ray. At least one further GI mirror is arranged in the imaging beam path as a counter GI mirror so that the deflection effect thereof acts in subtractive fashion for the chief ray in relation to the deflection effect of the basic GI mirrors. This can yield an imaging optical unit having enhanced flexibility in relation to an installation space used for mirror bodies of the mirrors of the imaging optical unit.

Imaging optical unit for imaging an object field into an image field

An imaging optical unit serves within a metrology system for examining a lithography mask. The lithography mask can be arranged in an object field of the imaging optical unit. The object field is defined by two mutually perpendicular object field coordinates. The imaging optical unit has an aperture stop of which the aspect ratio in the direction of the two object field coordinates differs from 1. This results in an imaging optical unit which can be used for the examination of lithography masks that are designed for projection exposure with an anamorphic projection optical unit.

Imaging optical unit for a metrology system for examining a lithography mask

An imaging optical unit for a projection exposure apparatus serves for imaging an object field in an object plane into an image field in an image plane. The image field is arranged at a field distance from the object plane. The optical unit has a plurality of mirrors. The imaging optical unit has a wavefront aberration over the image field of a maximum of 0.3 nm and an image-side numerical aperture of at least 0.5. The image field in at least one dimension has an extent of at least 10 mm. The result is an imaging optical unit in particular suited as part of an optical system for a projection exposure apparatus for projection lithography.

Imaging optical unit for a projection exposure apparatus

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Projection lens system of a microlithographic projection exposure installation

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D, a maximum image field height Y', and an image side numerical aperture NA; wherein COMP=D/(Y&#x2032;&#xb7;NA) and wherein the condition COMP&#x3c;10 holds.

Immersion catadioptric projection objective having two intermediate images

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D, a maximum image field height Y', and an image side numerical aperture NA; wherein COMP=D/(Y&#x2032;&#xb7;NA) and wherein the condition COMP&#x3c;10 holds.

Catadioptric projection objective

A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

Projection objective of a microlithographic projection exposure apparatus

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D, a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1=D/(Y&#x2032;&#xb7;NA) and wherein the condition COMP1&#x3c;10 holds.

In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

Projection objective for lithography

Growing community of inventors

Aalen, Germany

Susanne Beder