Other

International Business Machines Corporation

Kabushiki Kaisha Toshiba

Siemens Aktiengesellschaft

Agilent Technologies, Inc.

Susan L Cohen

Lorraine Arnfeld

David Lee Rath

Kamalesh K Srivastava

Soichi Nadahara

Cuc Kim Huynh

Matthew J Rutten

James Albert Gilhooly

Russell Herbert Arndt

Jin J Wu

Douglas P Nadeau

William Christopher Hudson

Klaus Dieter Penner

Colleen M Snavely

Ronald Hoyer

Robert Albin Jurjevic

Wilford C Downs

Paul Boguszewski

Emmanuel I Cooper

Iris Glenn

Russ Arndt

A changing table cover comprises a sheet, a pillow and a bag. The sheet includes a plurality of corner portions, at least two of which include elastic material. The pillow is affixed to a top surface of the sheet. The bag is affixed to an end portion of the sheet.

Changing table cover

A dried blood-spotting device includes a carrier card having a window therethrough along with a punchable glass fiber paper disposed in the window for a uniform absorption of a blood droplet sample into a homogeneous circular sport. The glass fiber paper is configured for enabling improved analysis for small molecules by liquid chromatography/mass spectrometry of punched specimens of the sample absorbed glass fiber paper.

Dried blood spotting paper device and method

A universal end cap for displaying collateral on a fixture arm is described. The end cap is mounted on a fixture arm for displaying collateral and has a frame of a base, a lip protruding from the base, a channel in the lip, and a slot in the lip, whereby the collateral fits through the slot and is engaged by the channel; an attachment section coupled to the frame and having a wall projecting from the frame and a head section and a pair of jaw sections protruding inwards from the wall, the head section and the jaw sections defining a keyhole slot having a first slot defined by the jaw sections and a second slot defined by the head section and the jaw sections; and a ratchet securing an end cap key of the fixture arm within the keyhole slot, the ratchet being an framework mounted within guides on the frame and teeth located on the frame between the guides, the framework being a securing face, a latch, a finger mounted to the latch and protruding from the latch in a direction toward the frame, and a tab mounted to the latch and protruding from the latch in a direction away from the frame, the latch biased to engage the finger in the teeth and the tab operable to disengage the finger from the teeth.

Universal end cap for retail fixtures

A method for forming silica stain on a substrate to facilitate monitoring of the silica stain during integrated circuit manufacture. The method includes providing a silica stain test structure which has a silicon substrate, a hydrophilic silicon dioxide containing layer disposed above the silicon substrate, and a plurality of cavities formed in the silicon substrate through the silicon dioxide containing layer. The cavities have hydrophobic sidewalls. The method also includes exposing the silica stain test structure to deionized water, and drying the silica stain test structure to form the silica stain on the silicon dioxide containing layer.

Method for making silica strain test structures

A vapor drying system includes a tank for holding a drying liquid and a heater for boiling the drying liquid in the tank to produce a vapor. A manifold is arranged in the tank for bubbling gas into the drying liquid. A controller is configured to cause the manifold to bubble gas into the drying liquid at a time when substrates to be dried are first introduced into the tank in order to quench the boiling of the drying liquid and generate a saturated vapor at a rate sufficient to achieve condensation of the drying liquid over substantially the entire surface of each of the substrates to be dried. In this way, staining of the substrates is reduced and process yield is improved.

Vapor drying system and method

An efficient cleaning process of microelectronics devices requires lower levels of megasonic power, lower temperature and much lower concentrations of chemicals. The method controls the effectiveness of megasonics-assisted cleaning of microelectronics devices by securing a gas concentration level in the cleaning solution, such that at the process temperature the solution is partially saturated with the gas. The gas concentration can be controlled either at the plant-wide level or, preferably, at the point of use. In the latter case, two water supply inputs are provided, one of vacuum-degassed water and the other of gas-saturated water. Process water in the desired gas concentration is then obtained by mixing water from the two sources in an appropriate ratio, which resulting mixture is fed to the wafer cleaning vessel.

Control of gas content in process liquids for improved megasonic

A method for cleaning the surface of a semiconductor wafer by removing residual slurry particles adhered to the wafer surface after chemical-mechanical polishing is provided. The semiconductor wafer is subjected to a first polishing step using a basic aqueous solution of a nonionic polymeric surfactant comprising alkylphenoxypolyethoxyethanol, preferably nonylphenoxypolyethoxyethanol, at a concentration between about 30 to about 100 ppm and a quaternary ammonium hydroxide such as TMAH at a concentration between about 2.5% and about 6% by weight. A downforce of between about 0 and 2 psi (1.4.times.10.sup.5 dynes/cm.sup.2) is applied for at least 15 seconds. A second polishing step with an applied downforce of at least 4 psi is then employed while applying purified water. The method provides at least a ten fold reduction in the number of submicronic slurry particles remaining on the wafer surface and can be completed within a commercially acceptable amount of time. In addition, particles as small as 0.007 .mu.m can be removed. The method also provides a level of accuracy in the predictability of the number of residual particles remaining on the wafer surface.

Process for removing residue from a semiconductor wafer after

Expandable shopping bag

An expandable carrying bag having a front surface, a rear surface, two side surfaces and an open top. The bag is characterized by at least one open loop on at least one surface of said bag. The loop is of a size sufficient to accommodate insertion of a forearm therein. In use, a forearm is inserted into the loops and the bag is pressed against the body. In this way, the weight of the load within the bag is partially displaced from the bag to the forearm thereby reducing stress on the lower back muscles.

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Norwood, NJ, United States of America

Susan L Cohen