Samsung Sdi Co., Inc.

Sunyoung Yang

Sunghwan Kim

Seunghyun Kim

Yushin Park

Jaebum Lim

Hyo Young Kwon

Youjung Park

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a compound represented by Chemical Formula 1,  

Hardmask composition, hardmask layer and method of forming patterns

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.

A polymer including a structural unit represented by Chemical Formula 1, and an organic layer composition including the polymer, and method of forming patterns are provided.  The Chemical Formula 1 is the same as defined in the detailed description.

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Sunyoung Yang