Intel Corporation

Sunit Tyagi

Shahriar S Ahmed

Giuseppe Curello

Mark T Bohr

Stephen M Cea

Kelin J Kuhn

Gerhard Schrom

Mark Armstrong

Sanjay S Natarajan

Paul A Packan

Scott E Thompson

Ramune Nagisetty

Ravindra Soman

Robert S Chau

Matthew V Metz

Suman Datta

Chia-Hong Jan

Bernhard Sell

Edward Allyn Burton

Scott A Hareland

Nick Lindert

Gilroy J Vandentop

Timothy E Glassman

Markus Kuhn

Ying Zhou

Jeffrey L Miller

Ian R Post

Mohsen Alavi

Hemant V Deshpande

Chris Auth

Payman Aminzadeh

Nivruti Rai

Robert A Gasser

Christopher G Parker

Anshumali Kumar

Complementary metal oxide semiconductor transistors are formed on a silicon substrate. The substrate has a {100} crystallographic orientation. The transistors are formed on the substrate so that current flows in the channels of the transistors are parallel to the &#x3c;100&#x3e; direction. Additionally, longitudinal tensile stress is applied to the channels.

CMOS fabrication process utilizing special transistor orientation

A method comprising running an error correction code on data and storing the data and the result of the error correction code in memory, running an error correction code on the data when it is read from the memory, comparing the results of the error correction codes on the data from before and after the memory, correcting errors when the comparator determines a difference in the results of the error correction codes and lowering the operating voltage of the memory array while using the error correction.

Method and apparatus to lower operating voltages for memory arrays using error correcting codes

A semiconductor device and method for its fabrication are described. An active region spacer may be formed on a top surface of an isolation region and adjacent to a sidewall of an active region. In one embodiment, the active region spacer may suppress the formation of metal pipes in the active region.

Active region spacer for semiconductor devices and method to form the same

Various methods for forming a layer of strained silicon in a channel region of a device and devices constructed according to the disclosed methods. In one embodiment, a strain-inducing layer is formed, a relaxed layer is formed on the strain-inducing layer, a portion of the strain-inducing layer is removed, which allows the strain-inducing layer to relax and strain the relaxed layer.

Transistor with strain-inducing structure in channel

A MOS device comprises a gate stack comprising a gate electrode disposed on a gate dielectric, a first spacer and a second spacer formed on laterally opposite sides of the gate stack, a source region proximate to the first spacer, a drain region proximate to the second spacer, and a channel region subjacent to the gate stack and disposed between the source region and the drain region. The MOS device of the invention further includes a buried oxide (BOX) region subjacent to the channel region and disposed between the source region and the drain region. The BOX region enables deeper source and drain regions to be formed to reduce transistor resistance and silicide spike defects while preventing gate edge junction parasitic capacitance.

Strained silicon MOS device with box layer between the source and drain regions

Embodiments of the invention provide a transistor with stepped source and drain regions. The stepped regions may provide significant strain in a channel region while minimizing current leakage. The stepped regions may be formed by forming two recesses in a substrate to result in a stepped recess, and forming the source/drain regions in the recesses.

Device with stepped source/drain region profile

A method for making a semiconductor device is described. That method comprises forming on a substrate a buffer layer and a high-k gate dielectric layer, oxidizing the surface of the high-k gate dielectric layer, and then forming a gate electrode on the oxidized high-k gate dielectric layer.

Method for making a semiconductor device having an ultra-thin high-k gate dielectric

An improved MOS transistor and method for making it are described. The MOS transistor's source and drain have a first conductivity type and are separated from each other by a first region having a second conductivity type opposite to the first conductivity type. A second region, also having the second conductivity type, is formed adjacent to the drain and is separated from the first region by the drain.

High power PMOS device

Metal Oxide Semiconductor Field Effect Transistors (MOSFET) are disclosed. One MOSFET includes, a substrate having a well of a first conductivity type. The MOSFET also includes source and drain regions, of a second conductivity type, formed in the well arranged apart from each other. Moreover, the MOSFET includes a first region, of a second conductivity type, formed in the well near the drain region. The first region has a low doping. Furthermore, the MOSFET includes a second region of a second conductivity type, formed near the source region. The second region has a doping substantially higher than the doping of the first region. A second MOSFET includes a substrate having a well of a first conductivity type and source and drain regions, of a second conductivity type, formed in the well apart from each other. Moreover, the MOSFET includes a drain extension region of the second conductivity type, formed in the well near the drain region. Furthermore, the MOSFET includes a source extension region, of the second conductivity type, formed in the well near the source region. The source extension region is doped more heavily than the drain extension region. The source extension region extends deeper in the well than the drain extension region.

Asymmetric MOSFET devices

A method for making a semiconductor device. In that method, source and drain regions are epitaxially grown on a first part of a substrate. After a gate oxide is formed on a second part of the substrate, an etched polysilicon layer is formed on the gate oxide.

Process for making semiconductor device with epitaxially grown source and drain

Methods to produce asymmetric MOSFET devices

The present invention is a semiconductor device having and a method for forming wells by growing an epitaxial silicon layer wherein the epitaxial silicon layer has at least three silicon sublayers. The first sublayer is highly doped, the second sublayer is less doped, and the third sublayer is also highly doped. The use of the epitaxially grown wells allows for the placement of high dopant concentrations in regions of the well where electrical isolation is an issue and the placement of lower doped concentrations in regions of the well where electrical isolation is not as great an issue in order to help reduce the problem of parasitic capacitance.

Using epitaxially grown wells for reducing junction capacitances

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Portland, OR, United States of America

Sunit Tyagi