Clariant Finance (bvi) Limited

Hoechst Celanese Corporation

Sunit S Dixit

M Dalil Rahman

Dinesh N Khanna

Daniel P Aubin

Stanley F Wanat

Ralph R Dammel

Dana L Durham

Ping-Hung Lu

Joseph E Oberlander

Douglas S McKenzie

Michelle M Cook

Elaine G Kokinda

The present invention relates to an antireflective coating composition comprising an admixture of:

Antireflective coating material for photoresists

A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.

Fractionation of phenol formaldehyde condensate and photoresist

The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.

Fractionated novolak resin copolymer and photoresist composition

A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.

Quinonediazide positive photoresist utilizing mixed solvent consisting

A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.

Positive photoresist composition containing a 2,4-dinitro-1-naphthol

A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin fraction having a low metal ion content, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a photoresist compositions containing such a novolak resin, and a method for producing a semiconductor device using such a photoresist composition.

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Flemington, NJ, United States of America

Sunit S Dixit