Samsung Electronics Co., Ltd.

Dnf Co., Ltd.

Sk Specialty Co., Ltd

Sunhye Hwang

Younjoung Cho

Wonwoong Chung

Sang Ick Lee

Myong Woon Kim

Jungsik Choi

Sang Yong Jeon

In Kyung Jung

Jinhee Lee

Youngha Song

Byungkil Lee

Yonghun Shin

Sungdo Lee

A deposition system and a gas storage device, the deposition system including a process chamber; and a gas supply outside of the process chamber, the gas supply being configured to provide monochlorosilane, wherein the gas supply includes a cabinet; and a gas container inside the cabinet, and the gas container includes aluminum (Al).

Gas container and deposition system including the same

A method of forming a dielectric layer includes forming a preliminary dielectric layer on a substrate using a silicon precursor and performing an energy treatment on the preliminary dielectric layer to form a dielectric layer. In the dielectric layer, a ratio of Si&#x2014;CHbonding unit to Si&#x2014;O bonding unit ranges from 0.5 to 5.

Methods of forming a low-k dielectric layer and methods of fabricating a semiconductor device using the same

Growing community of inventors

Hwaseong-si, South Korea

Sunhye Hwang