Samsung Electronics Co., Ltd.

Sungsu Moon

Jaeduk Lee

Sohyeon Lee

Ikhyung Joo

Dong-Jun Lee

Changsub Lee

Jaihyuk Song

A semiconductor device includes a substrate having a recess therein that is partially filled with at least two semiconductor active regions. The recess has sidewalls and a bottom that are sufficiently lined with corresponding substrate insulating layers that the at least two semiconductor active regions are electrically isolated from the substrate, which surrounds the sidewalls and bottom of the recess. A sidewall insulating layer is provided, which extends as a partition between first and second ones of the at least two semiconductor active regions, such that the first and second ones of the at least two semiconductor active regions are electrically isolated from each other. First and second gate electrodes are provided in the first and second active regions, respectively.

Semiconductor devices with enhanced substrate isolation

A semiconductor device includes a substrate having an active region defined by a device isolation film and providing a first channel region; a first source/drain region in the active region on first and second sides of the first channel region; a gate structure having a first gate insulating film, a shared gate electrode, and a second gate insulating film, sequentially arranged on the active region; a cover semiconductor layer on the second gate insulating film and electrically separated from the active region to provide a second channel region; a second source/drain region in the cover semiconductor layer on first and second sides of the second channel region; first and second source/drain contacts respectively connected to the first and second source/drain regions; and a shared gate contact connected to the shared gate electrode.

Semiconductor devices

A semiconductor device includes a substrate having an active region defined by a device isolation film and providing a first channel region; a first source/drain region in the active region on first and second sides of the first channel region; a gate structure having a first gate insulating film, a shared gate electrode, and a second gate insulating film, sequentially arranged on the active region; a cover semiconductor layer on the second gate insulating film and electrically separated from the active region to provide a second channel region; a second source/drain region in the cover semiconductor layer on first and second sides of the second channel region first and second source/drain contacts respectively connected to the first and second source/drain regions; and a shared gate contact connected to the shared gate electrode.

Non-volatile memory devices and related methods are provided. The non-volatile memory devices include a memory cell array having a plurality of cell strings, each cell string including: a plurality of memory cells stacked in a direction perpendicular to a substrate, a ground selection transistor between the plurality of memory cells and the substrate, and a string selection transistor between the plurality of memory cells and a bit line; an address decoder coupled to the plurality of memory cells in the plurality of cell strings through word lines, to the string selection transistors in the plurality of cell strings through string selection lines, and to the ground selection transistors in the plurality of cell strings through a ground selection line; a read/write circuit coupled to the string selection transistors in the plurality of cell strings through the bit lines; and control logic configured to adjust a substrate voltage applied to the substrate such that threshold voltages of the ground selection transistors are higher than a predetermined level during read operations for at least one of the plurality of memory cells in the plurality of cell strings.

Growing community of inventors

Hwaseong-si, South Korea

Sungsu Moon