Samsung Electronics Co., Ltd.

Sungoh Park

Kuntack Lee

Hyosan Lee

Yongsun Ko

Byoungho Kwon

Sang Won Bae

Bo Yun Kim

Sol Han

Hongjin Kim

An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.

Etching composition

Etching composition and method of manufacturing semiconductor device using the same

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Seoul, South Korea

Sungoh Park