Samsung Electronics Co., Ltd.

Sungmin Jang

Taehyun Kim

Kibeen Jung

Haeyong Choi

Dong-Hee Kim

Seungjun Lee

Hyunkyo Oh

Su-Hwan Kim

Byeonghui Kim

Woosung Choi

Joungwoo Han

Kyeongmin Baek

Seongkeun Kang

Tae-Hyun Ko

Byungku Yoo

Jiwoon Lee

Han Kyoo Lee

Dai-Hee Lee

Seongyun Ryu

An integrated waste gas treatment system includes an adsorption/desorption device that receives a waste gas that includes an organic compound and an organic nitrogen compound exhausted from a semiconductor manufacturing facility, where the adsorption/desorption device adsorbs the organic compound and the organic nitrogen compound and concentrates and desorbs the organic compound and the organic nitrogen compound, and a catalytic decomposition device disposed adjacent to the adsorption/desorption device, where the catalytic decomposition device includes a catalytic chamber that provides a gas passage through which a gas desorbed from the adsorption/desorption device flows and an oxidation-reduction catalyst disposed in the gas passage that removes the organic compound and the organic nitrogen compound from the desorbed gas. The organic compound and the organic nitrogen compound are subjected to an oxidation treatment by the oxidation-reduction catalyst, and nitrogen oxides generated by the oxidation treatment are removed by a selective reduction reaction.

Catalytic decomposition device and integrated waste gas treatment system

A throttling method for a storage device is provided. The throttling method includes: receiving a write command from a host; identifying, using a first machine learning model, a throttling delay time; transmitting a completion message to the host according to the throttling delay time; collecting weights of the first machine learning model and performance information of the storage device corresponding to the weights; learning the weights and the performance information to generate an objective function indicating a relationship between the weights and the performance information using a second machine learning model of a weight learning device; selecting a weight corresponding to a maximum performance using the objective function; and updating the first machine learning model with the weight.

Storage device, storage system and throttling method thereof

A storage device includes a memory device including a plurality of memory blocks and a memory controller. The memory controller is configured to control a garbage collection operation of the memory device. The memory controller is also configured to select a victim block and a target block for performing the garbage collection operation among the plurality of memory blocks, according to state information of each of the plurality of memory blocks and feature information of data written in each of the plurality of memory blocks, by using a reinforcement learning model.

Storage device and operating method of memory controller

A desiccant replacing apparatus may include a supply-discharge member, a supply connection line connected to the supply-discharge member, an air conveyor coupled to the supply connection line, a discharge connection line connected to the supply-discharge member, and an air amplifier coupled to the discharge connection line. The supply-discharge member may include a housing providing an internal space, an injection line providing an injection path and penetrating the housing, an exhaust line providing an exhaust path connected to the internal space, and a filter in the internal space or the exhaust path. The supply connection line may be connected to the injection line, and the discharge connection line may be connected to the exhaust line.

Desiccant replacing apparatus and air dry system including the same

A substrate treatment apparatus includes a substrate treatment unit configured to provide a chemical solution to a substrate to treat the substrate, and a chemical supply unit configured to supply the chemical solution to the substrate treatment unit. The chemical supply unit includes a loader configured to load a canister containing the chemical solution to the chemical supply unit, a clamp configured to clamp the canister in place, a chemical supply line through which the chemical solution is supplied to the substrate treatment unit, and a coupler configured to couple the chemical supply line to the canister. The chemical supply unit is capable of automatically replacing the canister and the substrate.

Chemical supply unit capable of automatically replacing a canister and a substrate treatment apparatus having the same

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Suwon-si, South Korea

Sungmin Jang