Samsung Display Co., Ltd.

Sungmin Hur

Dongwon Han

Nari Ahn

Hyeongsuk Yoo

JinYoung Choi

Hyosung Kim

Junghan Seo

Hyun-Ju Lee

Hyunsang Seo

Hyungjong Lee

Manjae Park

Gyoseung Ku

A sputtering apparatus includes a rotary target extending in a first direction, a gas supply bar disposed on the rotary target, and a substrate holder positioned opposite the gas supply bar with respect to the rotary target. The gas supply bar includes a first flow path extending in the first direction, and a second flow path spaced apart from the first flow path in the first direction and separated from the first flow path.

Sputtering apparatus and CVD mask coating method using the same

A deposition mask includes a metal mask body in which a deposition opening is defined; and a coating layer including aluminum oxynitride, on an outer surface of the metal mask body.

Metal mask, method of manufacturing the same, and method of manufacturing display panel using the metal mask

A plasma-enhanced chemical vapor deposition device includes: a sprayer to spray a gas onto a substrate; a lift to support a mask including a pattern through which the gas to be sprayed by the sprayer passes, and to raise or lower the mask; and a susceptor to support the substrate on which the gas to be passed through the mask is to be deposited, and to raise or lower the substrate, wherein the susceptor includes a first ground to electrically contact the mask during a deposition process during which the gas is deposited on the substrate.

Plasma-enhanced chemical vapor deposition device and method of manufacturing display apparatus using the same

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Yongin-si, South Korea

Sungmin Hur