Samsung Electronics Co., Ltd.

Sungkwan Kim

Myung-Sun Kim

Soo-Kyung Kim

Junetaeg Lee

Hakyu Choi

Jaesung Yun

Jung-kuk Park

A method of fabricating an image sensor is provided. The method may include preparing a substrate with first to third pixel regions, coating a first color filter layer on the substrate, sequentially forming a first sacrificial layer and a first protection layer to cover the first color filter layer, forming a first photoresist pattern on the first protection layer to be overlapped with the first pixel region, performing a first dry etching process using the first photoresist pattern as an etch mask to the first sacrificial layer and the first protection layer to form a first color filter, a first sacrificial pattern, and a first protection pattern sequentially stacked on the first pixel region, and selectively removing the first sacrificial pattern to separate the first protection pattern from the first color filter.

Growing community of inventors

Hwaseong-si, South Korea

Sungkwan Kim