Samsung Electronics Co., Ltd.

Sunghun Jang

Sanghun Kim

Sungyeol Kim

Younghwan Kim

Youngdo Kim

Taemin Earmme

Sejin Oh

Changyun Lee

A plasma control device includes a matching circuit, a resonance circuit, and a controller. The matching circuit is connected to a first electrode of a plasma chamber including the first electrode and a second electrode, and matches impedance of a radio frequency (RF) power by an RF driving signal with an impedance of the first electrode. The RF driving signal is based on a first RF signal having a first frequency. The resonance circuit is connected between the second electrode and a ground voltage, and controls plasma distribution within the plasma chamber by providing resonance with respect to harmonics associated with the first frequency and by adjusting a ground impedance between the second electrode and the ground voltage. The controller provides the resonance circuit with a capacitance control signal associated with the resonance and switch control signals associated with the ground impedance.

Plasma control device and plasma processing system

Growing community of inventors

Suwon-si, South Korea

Sunghun Jang