Samsung Electronics Co., Ltd.

University of California

Samsung Sdi Co., Inc.

University of Massachusetts

California Institute of Technology

Unist-academy Industry Research Corporation

Unist Academy-industry

Sung Woo Hong

Thomas P Russell

Soojin Park

Byung Hee Sohn

Chanjae Ahn

Ting Xu

Sungwon Choi

Sun Jin Song

Won Suk Chang

Woo-Jin Bae

Sung Won Choi

Chan Jae Ahn

Robert H Grubbs

Harry A Atwater

Sang Soo Jee

A Ra Jo

Kyeong-Sik Ju

Byung-hee Sohn

Hyunjeong Jeon

Raymond Weitekamp

Byunghee Sohn

Christopher Scot Daeffler

Garret M Miyake

Victoria Piunova

Jae Wook Nam

Hongkyoon Choi

Yan Xia

Benjamin R Sveinbjornsson

Dong Hyun Lee

Semi Lee

Weiyin Gu

Doug Hyun Lee

A composition for preparing poly(imide-benzoxazole) copolymer is described, where the copolymer include: a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a diamine represented by Chemical Formula 3: wherein definitions of groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.

Composition of preparing poly(imide-benzoxazole) copolymer, poly(imide-benzoxazole) copolymer, article containing poly(imide-benzoxazole) copolymer, and display device including same

A poly(imide-amide) copolymer including a structural unit represented by Chemical Formula 1; a structural unit represented by Chemical Formula 2; and any one of a structural unit represented by Chemical Formula 3, an amic acid precursor of the structural unit represented by Chemical Formula 3, and a combination thereof; wherein a cured material of the poly(imide-amide) copolymer may have a tensile modulus of greater than or equal to about 5.5 GPa, and a yellowness index of less than or equal to about 5: 

Poly(imide-amide) copolymer, a method for preparing a poly(imide-amide) copolymer, and an article including a poly(imide-amide) copolymer

A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.

Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles

A method of preparing an optical film, preparing a coating composition including an amic acid-containing polymer represented by Chemical Formula 1 and at least one polymerization aid selected from an alkyl phosphite, an aryl phosphite, an alkyl phosphate, and an aryl phosphate; providing the coating composition on a substrate to form a coating layer; and applying heat to the coating layer to prepare a cured film: wherein, in Chemical Formula 1, are the same or different in each repeating unit, and are each independently at least one selected from an aromatic organic group, an aliphatic organic group, and an alicyclic organic group, and 0&#x2266;x&#x2266;1.

Optical film and method of preparing optical film

A slot die includes a material distribution chamber configured to distribute a casting solution supplied to the material distribution chamber, and a lip in which a slot including an expansion portion is defined and through which the casting solution distributed in the material distribution chamber is discharged, where a width of the expansion portion taken in a first direction is expanded from one side of the expansion portion to a lip end facing the one side and the one side of the expansion portion is apart from the lip end by a predetermined length taken along a second direction which is perpendicular to the first direction and substantially parallel to a flow direction of the casting solution.

Slot die for film manufacturing

The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.

Rapid self-assembly of block copolymers to photonic crystals

A polyimide precursor composition, including a polyamic acid including a repeating unit represented by Chemical Formula 1 and transparent metal oxide nanoparticles coordinated to a ligand represented by RCOOH, wherein R is a linear or branched C1-C4 alkyl or a linear or branched C2-C4 alkenyl: wherein variables Cy, A, R, and n34 in Chemical Formula I are described in the specification.

Polyimide precursor composition, method for preparing polyimide, polyimide prepared by using the method, and film including the polyimide

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Seoul, South Korea

Sung Woo Hong