Samsung Electronics Co., Ltd.

Sung-won Kwon

Hwan-Chul Jeon

Byung-Gook Kim

Mun Ja Kim

Jae-Hyuck Choi

Hee-Bom Kim

Yong-Seok Jung

Chang-young Jeong

Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle

A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Pellicle and photomask assembly including the same

Growing community of inventors

Suwon-si, South Korea

Sung-won Kwon