Qualcomm Incorporated

Sung Son

Chulmin Jung

Changho Jung

Arun Babu Pallerla

Po-Hung Chen

David Li

Derek Yang

Rahul Biradar

Ayan Paul

Ravindra Reddy Chekkera

Biju Manakkam Veetil

Shivendra Kushwaha

Venugopal Boynapalli

Yandong Gao

Xiao Chen

Chen-ju Hsieh

Jason Cheng

A semiconductor device includes: a memory circuit having a plurality of quadrants arranged at corners of the memory circuit and surrounding a bank control component; wherein a first quadrant of the plurality of quadrants includes a first bit cell core and a first set of input output circuits configured to access the first bit cell core, the first quadrant defined by a rectangular boundary that encloses portions of two perpendicular edges of the memory circuit; wherein a second quadrant of the plurality of quadrants includes a second bit cell core and a second set of input output circuits configured to access the second bit cell core, the second quadrant being adjacent the first quadrant, wherein a border between the first quadrant and the second quadrant defines a first axis about which the first quadrant and the second quadrant are symmetrical.

Memory circuit architecture

A drain programmed read-only memory includes a diffusion region that spans a width of a bitcell and forms a drain of a first transistor and a second transistor. A bit line lead in a metal layer adjacent the diffusion region extends across the width of the bitcell. A first via extends from an upper half of the bit line lead and couples to a drain of the first transistor. Similarly, a second via extends from a lower half of the bit line and couples to a drain of the second transistor.

Low-leakage drain-programmed ROM

A pseudo-triple-port memory is provided that includes a plurality of pseudo-triple-port bitcells, each pseudo-triple-port first bitcell having a first read port including a first word line coupled to a first bit line through a first access transistor, a second read port including a second word line coupled to a second bit line through a second access transistor, and a write port including both the word lines, both the bit lines, and the pair of access transistors.

Pseudo-triple-port SRAM

A bitcell architecture for a pseudo-triple-port memory is provided that includes a a bitcell arranged on a semiconductor substrate, the bitcell defining a bitcell width and a bitcell height and including a first access transistor and a second access transistor. A first metal layer adjacent the semiconductor substrate is patterned to form a pair of local bit lines arranged within the bitcell width. The pair of local bit lines includes a local bit line coupled to a terminal of the first access transistor and includes a complement local bit line coupled to a terminal of the second access transistor.

Pseudo-triple-port SRAM bitcell architecture

Growing community of inventors

San Jose, CA, United States of America

Sung Son