Mk Electron Co., Ltd.

Ligadp Co., Ltd.

Korea Advanced Institute of Science and Technology

Korea Electronics Technology Institute

Korea Institute of Industrial Technology

Hoseo University Academic Cooperation Foundation

Sung Jae Hong

Jeong Tak Moon

Young Woo Lee

Jae Hong Lee

Hui Jung Kim

Chang Woo Lee

Jae Won Chang

Yong Jin Park

Joo Jin

Jung Hwan Bang

Yong Ho Ko

Jong Soo Cho

Won Sik Hong

Seok Man Han

Hong Won Lee

Hyuck Mo Lee

Im Bok Lee

Ja Hyun Koo

Keun Soo Kim

The present invention provides a metal organic chemical vapor deposition device and a temperature control method therefor. The device comprises: a chamber; a susceptor which is installed inside the chamber to allow rotation therein, wherein at least one substrate is settled thereon; a plurality of heaters which heat the susceptor, wherein the temperature is independently controlled; a gas sprayer which is positioned in the upper part of the susceptor, and sprays gases of group III and V toward the susceptor; a plurality of temperature detection sensors which are positioned in the upper part of the susceptor, and measure the temperature of heating regions heated by each heater; and a controller which retains temperature setting values necessary for the heating regions, and controls the temperature of the heating regions by comparing sensing temperature values detected by each temperature detection sensor with the setting values necessary for the heating regions. According to the present invention, the metal organic chemical vapor deposition device and the temperature control method therefor can uniformly apply necessary temperature ramping to the entire substrates during process by effectively adjusting the temperature conditions essential for every epitaxial process in the metal organic chemical vapor deposition device, which carries out the process by changing the temperature up to 1200&#xb0; C. from room temperature. Therefore, the invention improves process efficiency and deposition uniformity.

Metal organic chemical vapor deposition device and temperature control method therefor

Provided are a lead-free solder, a solder paste, and a semiconductor device, and more particularly, a lead-free solder that includes Cu in a range from about 0.1 wt % to about 0.8 wt %, Pd in a range from about 0.001 wt % to about 0.1 wt %, Al in a range from about 0.001 wt % to about 0.1 wt %, Si in a range from about 0.001 wt % to about 0.1 wt %, and Sn and inevitable impurities as remainder, a solder paste and a semiconductor device including the lead-free solder. The lead-free solder and the solder paste are environment-friendly and have a high high-temperature stability and high reliability.

Lead free solder bumps

A temperature control method of a chemical vapor deposition device including: a chamber; a susceptor positioned on the inner side of the chamber allowing rotation therein, a wafer stacked on an upper side; a gas supplier disposed on the inner side of the chamber, and sprays gas toward the wafer; a heater disposed on the inner side of the susceptor, and heats the wafer; and a temperature sensor positioned in the chamber, and measures the temperature. The temperature control method includes: (a) calculating the temperature distribution of the susceptor based on a measured value of the temperature sensor, and dividing a section with relatively high temperature as a susceptor section and a section with relatively low temperature as a wafer section from the temperature distribution; and (b) controlling the heater by comparing a reference temperature with the temperature of a selected position of the susceptor section or the wafer section.

Temperature control method of chemical vapor deposition device

A tin (Sn)-based solder ball and a semiconductor package including the same are provided. The tin-based solder ball includes about 0.2 to 4 wt. % silver (Ag), about 0.1 to 1 wt. % copper (Cu), about 0.001 to 0.3 wt. % aluminum (Al), about 0.001% to 0.1 wt. % germanium (Ge), and balance of tin and unavoidable impurities. The tin-based solder ball has a high oxidation resistance.

Tin-based solder ball and semiconductor package including the same

Provided is a method in which a difference between a surface temperature of a susceptor and a surface temperature of a substrate is accurately grasped without using a complicated high-priced equipment. A temperature control method for a chemical vapor deposition apparatus includes detecting a rotation state of a susceptor on which a substrate is accumulated on a top surface thereof, measuring a temperature of the top surface of the susceptor, calculating a temperature distribution of the top surface of the susceptor, based on the detected rotation state and the measured temperature, and controlling the temperature of the top surface of the susceptor, based on the calculated temperature distribution.

Temperature control method for chemical vapor deposition apparatus

A gold (Au) alloy bonding wire for a semiconductor device is provided. The Au alloy bonding wire is manufactured by adding at least one of polonium (Po), promethium (Pm), thulium (Tm), and boron (B) to high-purity gold of 99.999% or more in an amount of 3&#x2013;30 parts per million (ppm) by weight and at least one of magnesium (Mg), sodium (Na), vanadium (V), molybdenum (Mo), and technetium (Tc) in an amount of 3&#x2013;30 ppm by weight to the high-purity gold. In the Au alloy bonding wire, high-temperature reliability after ball bonding is not reduced and damage near a ball neck in forming an ultra low loop of the Au alloy bonding wire can be prevented.

Gold alloy bonding wire for semiconductor device

Growing community of inventors

Seoul, South Korea

Sung Jae Hong