Samsung Electronics Co., Ltd.

Samsung Sds Co., Ltd.

Other

Korea Ptg Co., Ltd.

Sung-il Kim

Jung-Kyu Lee

Sung-hyeon Park

Seong-taek Lim

Pil-Kwon Jun

Sang-moon Chon

Tae-ho Yoon

Jun-ing Gil

Sung-Woo Lee

Hyung-chul Lee

Sung-Duck Kim

Jun-seok Kim

Jun-Seok Kim

Byong-dong Kim

Me-suk Jun

Boo-sup Lee

Jin-Yeob Kim

Seong-Gab Cho

Tae-Young Chung

Hyung-Chul Lee

Tae-Ho Yoon

Seong-Taek Lim

An interior permanent magnet motor includes a stator comprising a hollow and a plurality of coils provided around the hollow; and a rotor rotatably disposed in the hollow of the stator and comprising a plurality of permanent magnets therein. Each of the plurality of permanent magnets of the rotor comprises a central permanent magnet; a pair of side permanent magnets provided at opposite ends of the central permanent magnet to be inclined toward an outer circumferential surface of the rotor; and a pair of bathers provided between the central permanent magnet and the pair of side permanent magnets, a thickness of each of the pair of bathers is equal to or greater than a thickness of the central permanent magnet. The thickness of the central permanent magnet is greater than a thickness of each of the pair of side permanent magnets.

Interior permanent magnet motor including magnets arranged to be partitioned from barriers

Disclosed are a system and method for a grid-based geo-fencing service. A grid-based geo-fencing service system includes a storage unit configured to store area information including one or more grids and a determination unit configured to receive location coordinates of a moving object and determine whether the moving object is present in an area with reference to the area information. According to embodiments of the present disclosure, it is possible to effectively reduce the amount of calculation needed by a geo-fencing service system to determine whether location-tracking data corresponds to a specified area and thus effectively respond to the processing of a large amount of location-tracking data collected in real time.

System and method for grid-based geo-fencing service

Disclosed are a global server load balancer (GSLB) apparatus and a method for dynamically controlling cache time-to-live (TTL) in the GSLB apparatus. The GSLB apparatus which performs load balancing among a plurality of local servers includes a domain name system (DNS) query processor that receives a query message from a DNS server, a server selector that selects a local server among the plurality of local servers based on the received query message, a load calculator that collects state information of the GSLB apparatus, and calculates a load of the GSLB apparatus from the collected state information, and a TTL controller that updates a TTL of the GSLB apparatus based on the calculated load.

Global server load balancer apparatus and method for dynamically controlling time-to-live

An apparatus for cleaning an article comprises: a solution receptacle () for storing cleaning solution (); a cleaning chamber () for receiving an article (P) to clean; a material transporting conduit including a solution conduit () connected between the solution receptacle and the cleaning chamber for transporting the cleaning solution from the solution receptacle to the cleaning chamber to apply to the article received in the cleaning chamber, the material transporting conduit further including an air conduit () connected to a high-pressure air source () for transporting the high-pressure air there-through and to apply to the article; and a heating device () coupled with the solution conduit () and the air conduit () for heating both the cleaning solution in the solution conduit and the high-pressure air in the air conduit concurrently and to a heated temperature prior to applying to the article.

Part washer

An improved process for Polytetramethylene-Ether-Glycol-Diesters of the formula R&mdash;CO&mdash;O(CH,&mdash;CH,&mdash;CH,&mdash;CH,&mdash;O)n-COR,, in which R and R,are identical or different and are alkyl radicals or derivatives thereof, by polymerization of tetrahydrofuran in the presence of a heterogeneous polymerization catalyst and in the presence of a carboxylic anhydride. The use of aluminum silicate catalyst composed of acid-activated and calcinated natural halloysite instead of the known catalytic silicates as bentonite, zeolite or kaolinite. The new catalyst with a very long lifetime produces polymers having more uniform properties and narrow molecular weight distribution even with a relative impure monomer.

Process for production of polytetramethylene-ether-glycol-diester using halloysite catalyst

An apparatus coats a semiconductor wafer with photoresist that is to be etched in the manufacture of the semiconductor. The apparatus includes a body having an open top, a spin chuck for revolving a wafer fixed thereon at a uniform rate, a bowl for preventing photoresist from spattering on the body and which is installed inside the body, a photoresist dispensing nozzle for spraying photoresist on the wafer, a side rinse nozzle for removing photoresist adhered to the peripheral edge of the wafer, a cover for opening/closing the top of the body, and a cleaning device associated with the cover for cleaning the bowl. The apparatus allows the bowl to be cleaned while the cover is closed and the bowl is still disposed inside the body. The cleaning device includes a sprinkler and a pump.

Apparatus for coating a semiconductor wafer with a photoresist

A dry etching method and apparatus improves the uniformity of etching a wafer in the manufacture of a semiconductor device. The dry etching apparatus has a susceptor supporting the wafer, a cooling system installed in the susceptor, an upper RF (radio frequency) electrode which may incorporate a gas diffuser for spraying reactive gas toward the wafer, and an RF power source for producing an electric field used to react the gas and generate plasma. The gap between the upper RF electrode and the susceptor is configured to accommodate for distortions in the wafer or other processing requirements. In addition, the nozzles of the gas diffuser can be configured to spray different amounts of gas to also enhance the etching uniformity. Finally, one of the electrodes may be divided into concentric sections. In this case, the RF power source can generate electric fields of different intensities at the sections. When the divided electrode is the susceptor, the cooling system cools the sections to different temperatures to in turn temperature-condition the wafer in a manner determined in advance to enhance the uniformity of the etching process.

Dry etching method and apparatus for manufacturing a semiconductor device

A thinner composition used in a washing process for manufacturing semiconductor devices includes at least ethyl lactate (EL) and ethyl-3-ethoxy propionate (EEP), and preferably, additionally includes Gamma-butyrolactone. The thinner composition has high volatility and low viscosity as well as a sufficient solubility rate for rinsing photoresist on the wafer when spraying the thinner through nozzles. Photoresist at the edge or backside of a wafer can be effectively removed at a sufficiently rapid rate, so that the yield of the semiconductor devices is enhanced. In addition, any remaining photoresist attached to the surface can be completely removed to enable the reuse of the wafer, with resulting economic benefits.

Thinner composition for washing a photoresist in a process for preparing

A developing solution feed system for a semiconductor photolithography process feeds the developing solution while removing any gas contained in the solution at a high solution feed pressure. The developing solution feed system has a plurality of feed tanks and a developing solution feed line having a plurality of first connecting pipes, each connected to the feed tanks, a second connecting pipe connected to the first connecting pipe to be converged into one passage, and a plurality of third connecting pipes branching out from the second connecting pipe. The system also contains nozzles connected to the third connecting pipes to thereby sputter the developing solution onto wafers each located in process chambers, a gas removal device installed in the one passage of the second connecting pipe to thereby remove gas contained in the developing solution, and shut off valves, each installed in the third connecting pipes to thereby open and close passages, so that the developing solution can selectively be fed into only one process chamber at a time through the third connecting pipes.

Growing community of inventors

Seoul, South Korea

Sung-il Kim