Sk Enpulse Co., Ltd.

Samsung Electronics Co., Ltd.

Electronics and Telecommunications Research Institute

Sung Hoon Son

Inkyun Shin

Min Gyo Jeong

Seong Yoon Kim

Suk Young Choi

Hyung-Joo Lee

GeonGon Lee

Suhyeon Kim

Geun Tae Bae

Jiyeon Ryu

Do Ha Hwang

HaHyeon Cho

Kyuhun Kim

Hyung-joo Lee

Jong Seok Kim

Woong Hee Lee

Chei-Yol Kim

Eun-Ji Lim

Sung-In Jung

Ho Jae Lee

Disclosed is a blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, wherein when a surface of the light shielding film includes nine sectors formed by trisecting the surface of the light shielding film vertically and horizontally, each of the nine sectors has a Rsk value, respectively, and an average value of the Rsk values of the nine sectors is equal to −0.64 or more and less than or equal to 0, where Rsk value is a height symmetry of the surface of the light shielding film measured in accordance with ISO_4287, and wherein an average value of Rku values, which are kurtosis of the surface of the light shielding film measured in accordance with ISO_4287, of the nine sectors is 3 or less.

Blank mask and photomask using the same

A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 2θ of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 2θ of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1. XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.

The present disclosure relates to a blank mask and the like, and comprises a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The blank mask has a TFT1 value of 0.25 μm/100° C. or less expressed by Equation 1 below:

The present disclosure relates to a blank mask including: a transparent substrate; and

A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface of the light shielding film has a first contact angle of 40° to 45° measured by using diiodo-methane as a first liquid contacting the surface of the light shielding film, is disclosed.

The present disclosure relates to a blank mask and the like, and comprises a transparent substrate and a light shielding film disposed on the transparent substrate. The light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The light shielding film comprises a first light shielding layer and a second light shielding layer disposed on the first light shielding layer. The light shielding film has an Rd value of Equation 1 below which is 0.4 to 0.8.  [Equation 1] In the Equation 1, the ervalue is an etching rate of the first light shielding layer measured by etching with argon gas. The ervalue is an etching rate of the second light shielding layer measured by etching with argon gas. In such a blank mask, a resolution degradation can be suppressed effectively when the light shielding film is patterned.

A method for processing fingerprint information may include obtaining an input image corresponding to at least a region of a user fingerprint, searching a memory storing at least one registered image for a reference registered image that matches the input image at least partially, determining a unique region of the input image in which the input image does not overlap with the reference registered image when the input image is aligned with the reference registered image, and, in response to a score of the unique region of the input image being greater than or equal to a predetermined reference score, classifying the input image as belonging to a same group as the reference registered image and storing the input image in the memory.

Fingerprint sensor and method for processing fingerprint information

A method for processing fingerprint information includes dividing an input image that corresponds to at least a portion of a user fingerprint into a plurality of first regions; dividing a registered image that had previously been stored into a plurality of second regions; selecting a first matching region from among the plurality of first regions, and selecting a second matching region from among the plurality of second regions, by comparing the plurality of first regions with the plurality of second regions; and matching the registered image with the input image by comparing the first matching region with the second matching region.

Method of processing fingerprint information

There is provided a socket compatibility layer for a TOE in a high quality server system. The socket compatibility layer for a TOE provides a standard socket API to an application program and provides binary-level compatibility so that a networking function of a TOE can be used without modifying the conventional socket application program thereby supporting simultaneous use of a TOE and a general Ethernet-based NIC. In a kernel structure of the Linux operation system, the socket compatibility layer for a TOE is located below a BSD socket layer receiving a socket system call from an application program through a standard socket API, is located above an INET socket layer and a TOE driver to control connection between an upper layer and a lower layer, and transmits the socket system call received from the BSD socket layer to the TOE driver or the INET socket layer according to call contents of the socket system call. The socket compatibility layer for a TOE includes a TOE socket generation module, a virtual TOE socket, a TOE STREAM module unit and a TOE DGRAM module unit.

Growing community of inventors

Seoul, South Korea

Sung Hoon Son