Asm IP Holding B.v.

Sung Hoon Jun

Dong Rak Jung

Jeong Ho Lee

Hyun Soo Jang

Woo Chan Kim

Jong Won Shon

Julll Lee

Seung Wook Kim

Won Ki Jeong

Provided is a substrate processing apparatus in which parts are selectively lifted according to the purpose or subject of maintenance/repair during a maintenance/repair operation. The substrate processing apparatus includes: a chamber; a first cover and a second cover on the chamber; a lifting device connected to the first cover and configured to raise and lower the first cover; and a connection region. When the lifting device and the second cover are connected to each other via the connection region or the first and second covers are connected to each other via the connection region, the first and second covers are raised and lowered by the lifting device.

Substrate processing apparatus and method of operating the same

Disclosed are a substrate holder and a semiconductor manufacturing apparatus including the substrate holder. The substrate holder provides a reaction region by making face-sealing contact with a reactor wall. The substrate holder has an elastic behavior when pressure is applied thereto while the substrate holder makes face-sealing contact with the reactor wall. The semiconductor manufacturing apparatus includes the substrate holder and a gas supply unit configured to supply gas to the reaction region provided by the reactor wall and the substrate holder.

Thin film deposition apparatus

Exhaust flow control ring for semiconductor deposition apparatus

Growing community of inventors

Gyeonggi-do, South Korea

Sung Hoon Jun