Samsung Electronics Co., Ltd.

Samsung Corning Co., Ltd.

Other

Samsung Display Co., Ltd.

Sung Hen Cho

Ki Yong Song

Chang Ho Noh

Jin Young Kim

Euk Che Hwang

Jin Sung Kim

Han Sol Cho

Jin Taek Hwang

Ho Chul Lee

Tamara Byk

Sang Eun Park

Jong Min Kim

Jin Sung Choi

Jin Gyu Choi

Young Mok Son

Yong Young Park

Tae Rim Choi

Disclosed herein is a method of forming low-resistance metal pattern, which can be used to obtain a metal pattern having stable and excellent characteristics by performing sensitization treatment using a copper compound before an activation treatment for forming uniform and dense metal cores, a patterned metal structure, and display devices using the same.

Method of forming low-resistance metal pattern, patterned metal structure, and display devices using the same

Disclosed herein is a method of preparing a low resistance metal line, in which a wet plating technique is used instead of a vacuum film forming process in order to simplify the process and decrease the manufacturing cost. In addition, a self-assembled monolayer is formed that facilitates the increased adsorption density and strength of the metal catalyst resulting in the formation of a high-density metal catalyst layer, thereby obtaining a high-quality metal line. Also disclosed herein, are a patterned metal line structure, and a display device using the same.

Method of preparing low resistance metal line, patterned metal line structure, and display device using the same

Disclosed herein is a transparent electrode featuring the interposition of a nano-metal layer between a grid electrode on a transparent substrate and an electroconductive polymer layer, and a preparation method thereof. The transparent electrode can be produced in a continuous process at high productivity and low cost and can be applied to various display devices.

Transparent electrode and preparation method thereof

Disclosed herein is an electrochromic display device comprising a pair of transparent substrates facing each other, an anode electrode and a cathode electrode respectively formed on the transparent substrates, an electrolytic layer disposed between the anode electrode and the cathode electrode, an electrochromophore layer of a nano structure formed on at least one of the anode electrode and the cathode electrode, and a redox promoter layer coated with a conductive compound, on the other electrode.

Electro-chromic display device and method of manufacturing the same

Disclosed herein is a method for forming a highly conductive metal pattern which comprises forming a metal pattern on a substrate by the use of a photocatalyst and a selective electroless or electroplating process, and transferring the metal pattern to a flexible plastic substrate. According to the method, a highly conductive metal pattern can be effectively formed on a flexible plastic substrate within a short time, compared to conventional formation methods. Further disclosed is an EMI filter comprising a metal pattern formed by the method. The EMI filter not only exhibits high performances, but also is advantageous in terms of low manufacturing costs and simple manufacturing process. Accordingly, the EMI filter can be applied to a variety of flat panel display devices, including PDPs and organic ELs.

Method for forming highly conductive metal pattern on flexible substrate and EMI filter using metal pattern formed by the method

A method for forming a metal pattern with a low resistivity. The method may include the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal may be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern may be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Method of forming metal pattern having low resistivity

Disclosed herein is an electroless copper plating solution, including a copper salt, a completing agent, a reductant and a pH adjuster, in which the plating solution includes a 2,2-dipyridyl acid solution and the hydrogen ion concentration (pH) thereof is about 11.5 to about 13.0, a method of producing the same, and an electroless copper plating method. According to the plating solution of the present invention, an electroless copper plating film having stable and improved adhesivity and low electrical resistance can be obtained. Further, display devices including a metal pattern formed with the electroless copper plating solution can improve the reliability and price competitiveness of products prepared therefrom.

Electroless copper plating solution, method of producing the same and electroless copper plating method

Disclosed herein is an electrochromic device having the functionality of a secondary battery. The electrochromic device includes a plurality of secondary battery/display segments in which a double metal oxide layer comprising mesoporous metal oxide particles and macroporous metal oxide particles is disposed on a transparent electrode, and a cathode active material for a lithium secondary battery is disposed on a counter electrode to enable oxidation and reduction of lithium. Methods of manufacturing the electrochromic device are disclosed as well.

Electrochromic device having the functionality of a secondary battery and manufacturing method thereof

A method for treating a polymeric optical element which includes the steps of mounting a polymeric optical element into a chamber, injecting a compressed gas as an annealing medium into the chamber and annealing the polymeric optical element and removing the annealing medium from the chamber. The present method provides a new way of preventing disadvantageous molecular orientation and residual stress which causes a deterioration in the optical properties of the polymeric optical element.

Enhancement of optical and mechanical properties in a polymeric optical element by annealing under a compressed gas

A novel black matrix, a method for preparing the same, and a flat display device and an electromagnetic interference filter to which the black matrix is applied. The black matrix is prepared by exposing a photoactive compound to form a latent pattern of nuclei for crystal growth and treating the latent pattern of nuclei for crystal growth with a metal salt solution to give a metal particle-deposited pattern; forming an electroless Ni-plated layer on the metal particle-deposited pattern; and forming an electroless Cu-plated layer on the electroless Ni-plated layer. Exhibiting improved black tone, which is achieved only by a selective multilayer plating process, without using expensive vacuum sputtering apparatus or a photolithographic process, the black matrix can be applied to various flat display devices. In addition, due to improved electric conductivity, the black matrix can be used in an electromagnetic interference filter, without employing an additional front surface blackening process.

Black matrix, method for the preparation thereof, flat display device and electromagnetic interference filter employing the same

A black matrix, a method for preparing the black matrix, a flat panel display and an electromagnetic interference filter using the black matrix. The black matrix may comprise a substrate, a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer. The method may comprise the steps of forming a titanium oxide layer, forming a metal particle-deposited pattern on the titanium oxide layer, forming a Ni electroless plating layer on the metal particle-deposited pattern, and forming a Ni/Pd alloy layer on the Ni electroless plating layer. Since the black matrix may have a high blackening density via simple selective multilayer plating without using a high-price vacuum sputtering apparatus and undergoing photolithography, unlike conventional chromium-based black matrices, it may be employed in various flat panel displays. In addition, since the black matrix may exhibit superior electrical conductivity, it may be used in electromagnetic interference filters without additional front-surface blackening.

Black matrix, method for preparing the same, and flat panel display and electromagnetic interference filter using the same

A flexible electrochromic device including a flexible transparent electrode including a predetermined pattern, an insulating layer formed on a portion of the transparent electrode other than the predetermined pattern, a semiconductor layer formed on the predetermined pattern, an electrochromic monolayer formed on the semiconductor layer, a flexible counter electrode disposed to face the transparent electrode and an electrolyte provided in a space between the transparent electrode and the counter electrode.

Flexible electrochromic device and method of manufacturing the same

A method for manufacturing a high-transmittance optical filter for image display devices, which may include the steps of coating a photocatalytic compound on a transparent substrate to form a photocatalytic film, selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating to form a metal pattern, and selectively etching and removing the photocatalytic compound remaining on the transparent substrate using a buffered oxide etchant (BOE). According to the method, a high-transmittance, high-resolution and low-resistivity optical filter can be manufactured in a simple manner at low costs.

Method for manufacturing high-transmittance optical filter for image display devices

A cavity-preventing type reactor and a method for fabricating a preform for a plastic optical fiber using the same, wherein post-process charging of additional monomer or prepolymer into rotationally-induced central cavities is avoided by forming void-free plastic fibers using special geometric flow controllers combined with special materials combinations, pressures, and rotational techniques.

Cavity-preventing type reactor and a method for fabricating a preform for a plastic optical fiber using the same

A ballast device for a compact fluorescent lamp, comprises a ballast case including upper case 10-1, a lower case, and PCBs. The upper case has a incandescent lamp base 19 and the lower case has a socket substrate 11 having a compact fluorescent lamp socket. A bottom portion of the upper case is assembled with said lower case having a socket substrate 11. The PCBs includes a first PCB 15 where electronic circuit components 15-2 are mounted on, having a first receiving portion for allowing for the fluorescent lamp socket to be inserted in, and a second PCB 16 where a electronic circuit components 16-2 are mounted, and the mounted components 16-2 having long height are located in center area of the second PCB 16 to be located inside the bulb base 19.

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Seoul, South Korea

Sung Hen Cho