Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Sun-Joo Park

Hong-Sick Park

Bong-Kyun Kim

Byung-Uk Kim

Jong-Hyun Jeong

Suk-Il Yoon

Jong-Hyun Choung

Shin-Il Choi

Byeong-Jin Lee

Sun-Young Hong

Young-Joo Choi

Wang-Woo Lee

Nam-Seok Suh

Soon-Beom Huh

Se-Hwan Jung

Doo-Young Jang

Sung-Gun Shin

Oh-Hwan Kweon

Seok-Jun Jang

Soon-Beom Hur

A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide ('TMAH'), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.

Composition for removing a photoresist and method of manufacturing a thin-film transistor substrate using the composition

A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.

Composition for photoresist stripper and method of fabricating thin film transistor array substrate

Growing community of inventors

Pyeongtaek-si, South Korea

Sun-Joo Park