Ngr Limited

Tasmit, Inc.

Sumio Sasaki

Makoto Kato

Yuichiro Yamazaki

Yukihiro Tanaka

Kazufumi Kubota

Susumu Takashima

The present invention relates to an apparatus and method for analyzing the energy of backscattered electrons generated from a specimen. The apparatus includes: an electron beam source () for generating a primary electron beam; an electron optical system () configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system configured to detect an energy spectrum of backscattered electrons emitted from the specimen. The energy analyzing system includes: a Wien filter () configured to disperse the backscattered electrons; a detector () configured to measure the energy spectrum of the backscattered electrons dispersed by the Wien filter (); and an operation controller () configured to change an intensity of a quadrupole field of the Wien filter (), while moving a detecting position of the detector () for the backscattered electrons in synchronization with the change in the intensity of the quadrupole field.

Apparatus and method for measuring energy spectrum of backscattered electrons

A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.

Secondary particle detection system of scanning electron microscope

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Yokohama, Japan

Sumio Sasaki