Sumco Corporation

Sumio Miyazaki

Shinjirou Uchida

Noritomo Mitsugi

Shuichi Samata

Sayaka Makise

Provided is a method of evaluating a silicon layer, including forming an oxide film on a surface of a silicon layer, performing a charging treatment of charging a surface of the formed oxide film to a negative charge, and measuring a resistivity of the silicon layer that has been subjected to the charging treatment by a van der Pauw method.

Method of evaluating silicon layer and a method of manufacturing silicon epitaxial wafer

An apparatus for evaluating an epitaxial layer, including pre-treating the epitaxial layer before evaluation of the epitaxial layer by making the epitaxial layer contact with a metal electrode by a capacitance-voltage measurement, the method comprising; applying carbon-bearing compound to a surface of the epitaxial layer; subsequently irradiating ultraviolet light to the surface of the epitaxial layer; and thereby forming an oxide film on the surface of the epitaxial layer. An apparatus for evaluating an epitaxial layer of an epitaxial wafer, the apparatus including a pretreatment unit for pre-treating an epitaxial wafer having a semiconductor wafer and an epitaxial layer formed on the semiconductor wafer, a metal-electrode which can be made contact with or vapor-deposited on the surface of the epitaxial layer of the epitaxial wafer which has been pre-treated in the pretreatment unit, a measuring electrode which can be made contact with or vapor-deposited on the semiconductor wafer, and a measuring unit which is connected to each of the electrodes and is used to measure physical properties of the epitaxial layer. The pretreatment unit includes an applying device for applying a carbon-bearing compound to a surface of the epitaxial layer, and an irradiation device for irradiating ultraviolet light to the surface of the epitaxial layer in an oxygen-bearing atmosphere.

Method for pre-treating epitaxial layer, method for evaluating epitaxial layer, and apparatus for evaluating epitaxial layer

A method for pre-treating an epitaxial layer performed before evaluation of the epitaxial layer by making the epitaxial layer contact with a metal electrode by a capacitance-voltage measurement, the method comprising; applying carbon-bearing compound to a surface of the epitaxial layer; subsequently irradiating ultraviolet light to the surface of the epitaxial layer; and thereby forming an oxide film on the surface of the epitaxial layer.

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Tokyo, Japan

Sumio Miyazaki