Toppan Printing Co., Ltd.

Sumika Tamura

Kiyoaki Nishitsuji

Naoko Mikami

Takehiro Nishi

Daisei Fujito

Mikio Shinno

Reiji Terada

Masashi Kurata

A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 &#x3bc;m or less by etching the processing object by 3 &#x3bc;m or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 &#x3bc;m or more, thereby obtaining a metal mask sheet.

Method for producing base for metal masks, method for producing metal mask for vapor deposition, base for metal masks, and metal mask for vapor deposition

A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 &#x3bc;m. The target surface has a surface roughness Sz of less than or equal to 0.308 &#x3bc;m.

Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition

A metal mask substrate includes a metal surface to which a resist is to be disposed. A specular reflectance of incident light to the surface is 45.2% or more.

Metal mask substrate, metal mask substrate control method, metal mask, and metal mask production method

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Tokyo, Japan

Sumika Tamura