Samsung Electronics Co., Ltd.

Dongjin Semichem Co., Ltd.

Sukkoo Hong

Sumin Kim

Hyunwoo Kim

Juhyeon Park

Sunyoung Lee

Jihyun Kim

Yoonhyun Kwak

Aram Jeon

Eunkyung Lee

Sungwon Choi

Byunghee Sohn

HyunJin Kim

Youngmin Nam

Miyeong Kang

JinJoo Kim

Giyoung Song

Hyereun Kim

Jungyoul Lee

Jongkyoung Park

Hyojung Roh

Juyoung Kim

Hyunji Song

Songse Yi

Yechan Kim

Sunghwan Park

Jicheol Park

Honggu Im

Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.

Photoresist compositions and methods of fabricating a semiconductor device

A polymer having a repeating unit represented by Formula 1:

Polymer and composition for forming an anti-reflective film and method of manufacturing an integrated circuit device using the anti-reflective film

Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:

Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator

Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: 

Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device

A polymer having a repeating unit represented by Formula 1: 

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Suwon-si, South Korea

Sukkoo Hong