Korea Institute of Science and Technology

Sukang Bae

Tae-Wook Kim

Dong Su Lee

Sang Hyun Lee

Seoung-Ki Lee

Myung Jong Kim

Byung Joon Moon

Dae-Young Jeon

Min Cheol Park

Sang Jin Kim

Jin-Hyung Park

Jung Ho Kang

Nam Dong Kim

Sunbin Hwang

Dongheon Shin

Changhyup Lee

Young Min Seo

Sungchan Park

Hyunjin Cho

Ho-Koang Choi

Ye Lin Oh

Sang Ook Kang

Disclosed is a carbon nanomaterial-based structure, including: a polymer resin layer; and a carbon nanomaterial layer stacked on the polymer substrate, wherein the carbon nanomaterial is a carbon nanomaterial doped by electron beams.

Carbon nanomaterial-based structure using electron beam, flexible transparent electrode comprising the same, and method for producing the same

Provided is a method for manufacturing a single-atom catalyst supported on a carbon support, including treating a mixture of a precursor of a carbon support and a precursor of a hetero element other than carbon through a dry vapor phase process, thereby supporting, on a carbon support, a single-atom catalyst containing a hetero element other than carbon.

Method for preparing single-atom catalyst supported on carbon support

An electromagnetic wave shielding film includes a substrate; and an electromagnetic wave shielding layer disposed on the substrate and including a laminated structure having a planar shape and including a stack of metal nanoplates, wherein each metal nanoplate of the stack of metal nanoplates is staggered with respect to one or more other metal nanoplate of the stack of metal nanoplates so that the laminated structure has pores defined therein and between laminated structures in a stack of laminates structures. An additional embodiment of an electromagnetic wave shielding film includes an electromagnetic wave shielding layer including a composite of a polymer resin matrix composed of a polymer and at least one metal nanoplate, wherein each metal nanoplate of the at least one metal nanoplate is staggered with respect to one or more other metal nanoplate of the at least one metal nanoplate so that the composite has pores defined therein.

Electromagnetic interference shielding film having a laminated structure including a stack of metal nanoplates and a nano electrode including the same

A fiber-type electronic device comprising a pattern for electronic devices stacked on a fiber filament substrate is provided. It is possible to manufacture an electronic device directly on a fiber filament substrate by applying the pattern for electronic devices. Thus, it can be widely used for wearable devices and the like. The pattern for electronic devices is manufactured by a method for forming a pattern for electronic devices comprising an exposure process using a maskless exposure apparatus. Thus, it is possible to manufacture a pattern for electronic devices on a fiber filament substrate through a continuous process and thus to increase the process efficiency.

Method for manufacturing pattern for electronic devices, and fiber-type electronic device comprising the pattern for electronic devices

Provided are nitrogen-doped carbon quantum dots as pyrolysis product of fumaronitrile. The carbon quantum dots may be formed in such a manner that nitrogen may be doped in an amount of 3-10 wt % based on the total weight of the carbon quantum dots with no need for a separate doping process. As a result, the carbon quantum dots have excellent properties, such as optical property, electroconductivity and thermal safety, and thus may be useful for photocatalysts or organic solar cells, or the like.

N-doped nanocarbon materials and method for manufacturing the same

Provided is a method for producing a high-quality boron nitride film grown by using a borazine oligomer as a precursor through a metal catalyst effect. The method solves the problems, such as control of a gaseous precursor and vapor pressure control, occurring in CVD (Chemical vapor deposition) according to the related art, and a high-quality hexagonal boron nitride film is obtained through a simple process at low cost. In addition, the hexagonal boron nitride film may be coated onto various structures and materials. Further, selective coating is allowed so as to carry out coating in a predetermined area and scale-up is also allowed. Therefore, the method may be useful for coating applications of composite materials and various materials.

Method for producing hexagonal boron nitride film using borazine oligomer as a precursor

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Jeollabuk-do, South Korea

Sukang Bae