Siliconware Precision Industries Co., Ltd.

Sui-An Kao

Hung-Yuan Hsu

Yi-Hung Lin

Meng-Tsung Lee

Feng-Lung Chien

Yi-Hsin Chen

A semiconductor structure includes a semiconductor chip having at least an electrode pad, a first metal layer formed on the electrode pad, a second metal layer completely formed on and in contact with the first metal layer, and a conductive pillar disposed on the second metal layer, where a material of the first metal layer is different from a material of the second metal layer, the first metal layer has a first distribution-projected area larger than a second distribution projected-area of the conductive pillar, and the second metal layer has a third distribution-projected area that is the same as the second distribution-projected area of the conductive pillar.

Semiconductor structure and fabrication method thereof

A chip structure having a redistribution layer includes: a chip with electrode pads disposed on an active surface thereof; a first passivation layer formed on the active surface and the electrode pads; a redistribution layer formed on the first passivation layer and having a plurality of wiring units, wherein each of the wiring units has a conductive pad, a conductive via and a conductive trace connecting the conductive pad and the conductive via, the conductive trace having at least a first through opening for exposing a portion of the first passivation layer; and a second passivation layer disposed on the first passivation layer and the redistribution layer, the second passivation layer being filled in the first through opening such that the first and second passivation layers are bonded to each other with the conductive trace sandwiched therebetween, thereby preventing delamination of the conductive trace from the second passivation layer.

Chip structure having redistribution layer

Chip structure having redistribution layer and fabrication method thereof

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Taichung, Taiwan

Sui-An Kao