Sk Enpulse Co., Ltd.

Samsung Electronics Co., Ltd.

Lg Electronics Inc.

Samsung Display Co., Ltd.

Seoul National University

Suhyeon Kim

Sung Hoon Son

Suk Young Choi

Seong Yoon Kim

Min Gyo Jeong

Inkyun Shin

Hyung-Joo Lee

Jiyeon Ryu

GeonGon Lee

Taewan Kim

HaHyeon Cho

Kyuhun Kim

Hyung-joo Lee

Hoon Jong Kang

Jintae Kim

Beom-seok Lee

Sanghyun Yun

Je-Kyun Park

Jeonggun Lee

Tae Gyu Hwang

Jae Pil Kim

Jin Woong Namgoong

Kihoon Na

Jong Hoon Hahn

Kwanscop Lim

Disclosed is a blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, wherein when a surface of the light shielding film includes nine sectors formed by trisecting the surface of the light shielding film vertically and horizontally, each of the nine sectors has a Rsk value, respectively, and an average value of the Rsk values of the nine sectors is equal to −0.64 or more and less than or equal to 0, where Rsk value is a height symmetry of the surface of the light shielding film measured in accordance with ISO_4287, and wherein an average value of Rku values, which are kurtosis of the surface of the light shielding film measured in accordance with ISO_4287, of the nine sectors is 3 or less.

Blank mask and photomask using the same

A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 2θ of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 2θ of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1. XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.

The present disclosure relates to a blank mask and the like, and comprises a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The blank mask has a TFT1 value of 0.25 μm/100° C. or less expressed by Equation 1 below:

The present disclosure relates to a blank mask including: a transparent substrate; and

A display device includes a substrate, a display element layer disposed on the substrate, and a protective layer disposed on the display element layer. The display device contains a light absorber represented by Formula 1, and the damage to the display device that may be caused by the UV-A light in the wavelength range of about 315 nm to about 400 nm may be prevented or reduced, and the reliability of the display device may be maintained:

Display device and light absorber for display device

Provided are a centrifugal force based platform formed to be rotatable and including a home mark having a retro-reflective property of light, and a centrifugal force based microfluidic system including the platform. The method of determining a home position of the centrifugal force based platform includes: rotating the platform formed and including a home mark having a retro-reflective property of light; emitting light from a light-emitting unit to the platform; and detecting the emitted light, which is retro-reflected by the home mark, in a light-receiving unit, and then determining the home position of the platform based on the detected light.

Centrifugal force based platform, microfluidic system including the same, and method of determining home position of the platform

A system and a method for detecting fluorescence in a microfluidic chip having a microchamber and measuring the amount of the fluorescence are disclosed. In the system and method, an optical device detects fluorescence generated by a fluorescent material. The position of the outer circumference of a microfluidic chip is identified based on the change of the amount of the detected fluorescence. Then, the position of a microchannel is calculated based on the position of the outer circumference of the microfluidic chip and the distance between the outer circumference and the microchamber. Hence, the amount of the fluorescence only generated from the microchamber of the microfluidic chip is automatically calculated. Further, a plurality of samples can be analyzed at the same time, thereby reducing analysis time and cost.

System and method for detecting fluorescence in microfluidic chip

Various kinds of fluid can be handled and delivered accurately in infinitesimal amounts through microchannels formed in an elastic polymeric substrate by periodically squeezing selective portions of the microchannel using a rotor to apply an external force on the elastic substrate. The delivery rate of the fluid is in the range from pL/sec to mL/sec determined by the rotation speed of the rotor which presses the microchannels and the dimensions of the microchannel. Regardless of physical properties of the fluid to be delivered, various kinds of fluids can be accurately delivered through the microchannels in the desired amount.

Method for handling and delivering fluid on a lab-on-a-chip

Growing community of inventors

Seoul, South Korea

Suhyeon Kim