Asml Netherlands B.v.

Sudharshanan Raghunathan

Patricius Aloysius Jacobus Tinnemans

Franciscus Godefridus Casper Bijnen

Boris Menchtchikov

Hakki Ergün Cekli

Edo Maria Hulsebos

Ralph Brinkhof

Henricus Johannes Lambertus Megens

Maikel Robert Goosen

Weitian Kou

Willem Seine Christian Roelofs

Hadi Yagubizade

Loek Johannes Petrus Verhees

Manouk Rijpstra

Wendy Johanna Martina Van De Ven

Ahmet Koray Erdamar

Matthijs Cox

Tran Thanh Thuy Vu

Maaike Van't Westeinde

Stefan Hunsche

Hermanus Adrianus Dillen

Abraham Slachter

Koenraad Van Ingen Schenau

Marleen Kooiman

Fuming Wang

Marie-Claire Van Lare

Aiqin Jiang

Vadim Yourievich Timoshkov

Luis Alberto Colina Santamaría Colina

Methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of a characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining a probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.

Method for calibrating simulation process based on defect-based process window

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method including: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

Lithographic method

A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.

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Fremont, CA, United States of America

Sudharshanan Raghunathan