Indian Institute of Technology Kanpur

Sudeep Bhattacharjee

Samit Paul

Jose Vettiyankal Mathew

An apparatus for characterizing a focused charged beam is provided. The apparatus includes a plurality of parallel conducting channels and at least one current sensing unit configured to measure current across each of the plurality of parallel conducting channels.

System and method for characterizing focused charged beams

A focused ion beam system is provided. The focused ion beam system includes a plasma generation chamber configured to contain a source gas that is radiated with microwaves to produce plasma. The plasma generation chamber includes a plasma confinement device configured to confine the plasma in radial and axial directions within the plasma generation chamber and to form a plasma meniscus at an extraction end of the plasma generation chamber. The focused ion beam system also includes a beam extraction chamber configured to extract a focused ion beam from the confined plasma and to focus the extracted focused ion beam on a workpiece.

Growing community of inventors

Kanpur, India

Sudeep Bhattacharjee