Intel Corporation

Subramani Iyer

Robert J Chroneos, Jr

Ho Fang

The present disclosure is directed to a manifold assembly for a trap filter system having an inlet for receiving a flow of gas effluents containing contaminants generated by a semiconductor processing tool, a housing for a plurality of filters, wherein the plurality of trap filters connected to the inlet and are interchangeable while the semiconductor processing tool remains in operation, and a bypass mechanism configured to selectively direct or shut off the flow of gas effluent to one or more of the plurality of trap filters, wherein each of the plurality of filter is removable and replaceable when the filter is unable to effectuate the removal of contaminants.

Manifold assembly for trap filter systems

The present disclosure is directed to an electrostatic charge measurement tool and dedicated system having a probe configured to scan the surface of a target, and methods for taking the electrostatic charge measurements. In an aspect, the probe is a non-contact electrostatic probe that may be moveable across the surface of the target and be adjustable in its height from the surface of the target. In another aspect, the target is an electrostatic chuck or semiconductor wafer. In a further aspect, the electrostatic charge measurement system may perform insitu measurement of targets without removing them from their working environment.

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Fremont, CA, United States of America

Subramani Iyer