Samsung Display Co., Ltd.

Su-Yeon Sim

Hi-Kuk Lee

Cha-Dong Kim

Jung-In Park

Ju-Won Yoon

Sang-Hyun Yun

Ki-beom Lee

Chang-Hoon Kim

Hi Kuk Lee

Sang Hyun Yun

Seungmin Lee

Seung Min Lee

Sanghyun Lee

Jeongho Lee

Jeong Ho Lee

Jeong-Ho Lee

Sang Hyun Lee

Yong-Il Kim

Jin Sung An

Choong-Youl Im

Il-Jeong Lee

Sang-tae Kim

Jae-Hyuk Chang

Dohyun Kwon

Gichang Lee

Choongyoul Im

Jung-Kyu Lee

Iljeong Lee

Choong Youl Im

Wang-Woo Lee

Seung-Min Lee

Jaehyuk Chang

Ki Beom Lee

Il Jeong Lee

Chang Hoon Kim

Hikuk Lee

Kibeom Lee

Tsunemitsu Torigoe

Shi-Jin Sung

Changhoon Kim

Sang-Hyn Lee

Eun-Sang Lee

Sung-Yeol Jin

An organic light emitting display device includes an (i&#x2212;1)th pixel, an i-th pixel, and an (i+1)th pixel, each including an organic light emitting diode and a driving transistor to control a driving current flowing through the organic light emitting diode. A first node of the i-th pixel, to which a control electrode of the driving transistor of the i-th pixel is connected, is initialized to an initialization voltage in synchronization with an (i&#x2212;1)th scan signal applied to the i-th pixel, and an anode of the organic light emitting diode of the i-th pixel is initialized to the initialization voltage in synchronization with an i-th scan signal applied to the (i+1)th pixel.

Organic light emitting display device

A digital exposure device including a GLV or a DMD. The digital exposure device also includes: a stage to support and move a substrate in a scan direction; an optical system disposed between the stage and the GLV or the DMD, to form a pattern on the substrate by modulating light received from the GLV or the DMD; and a control unit to control the a width of the pattern by a unit, the unit being obtained by dividing the width of the pattern by a natural number m, in the second direction.

Digital exposure device using GLV and digital exposure device using DMD

In an aspect, a grating light valve module including: a substrate; and a plurality of ribbons disposed on the substrate, wherein each of the ribbons includes an insulating layer, a conductive layer disposed on the insulating layer, and an anti-oxidation layer disposed on the conductive layer is provided.

Maskless exposure device

A method of manufacturing a thin film transistor (TFT) array substrate is disclosed. In one aspect, the method includes forming an active layer on a substrate, forming a first insulating layer on the substrate to cover the active layer, and forming a first gate electrode on the first insulating layer in an area corresponding to the active layer, doping the active layer with ion impurities, forming a second insulating layer on the first insulating layer to cover the first gate electrode, performing an annealing process on the active layer, forming a lower electrode of a capacitor on the second insulating layer, forming a third insulating layer on the second insulating layer to cover the lower electrode, wherein the third insulating layer has a dielectric constant that is greater than those of the first and second insulating layers, and forming an upper electrode of the capacitor on the third insulating layer.

Thin-film transistor array substrate, display device including the same, and method of manufacturing the thin-film transistor array substrate

A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

Digital exposure apparatus and method of exposing a substrate using the same

Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

Photoresist composition and method of forming a color filter using the same

A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.

Photoresist composition and method of forming a black matrix using the same

An organic light emitting diodes display includes: a switching thin film transistor and a driving thin film transistor connected to the switching thin film transistor, wherein the driving thin film transistor includes a driving semiconductor layer section, a first gate insulating layer covering the driving semiconductor layer section, a floating gate electrode disposed on the first gate insulating layer, a second gate insulating layer covering the floating gate electrode, and a driving gate electrode disposed on the second gate insulating layer and at a position corresponding to the floating gate electrode, wherein the second gate insulating layer has a permittivity in the range of about 10 to about 100.

Organic light emitting diodes display

A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate

An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

Method of measuring uniformity of exposing light and exposure system for performing the same

A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

Method of forming a photosensitive pattern, method of manufacturing a display substrate, and display substrate

A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.

Photosensitive film pattern and method for manufacturing a photosensitive film pattern

Growing community of inventors

Changwon-si, South Korea

Su-Yeon Sim