Cheil Industries Inc.

Su Sun Jeong

Chang Ho Son

Han Ju Kang

Sung Jin An

Hee Cheol Lee

Cheol Yeon Hwang

An artificial silica marble comprises a matrix and a line pattern portion. The line pattern portion comprises fine lines having a width of about 50 to about 500 &#x3bc;m and forms a web- or net-like pattern. The line pattern portion divides or partitions the artificial silica marble into a plurality of irregularly shaped pattern portions to form an amorphous pattern in the cross section of the artificial silica marble.

Artificial silica marble having amorphous patterns and method for preparing the same

An artificial marble includes unsaturated polyester resin (A), compound including silica (B), and luminescent pigment (C). An artificial marble according to a second embodiment includes about 70 to about 95% by weight of a non-luminescent base material (I) comprising unsaturated polyester resin (A), compound including silica (B), and organic/inorganic pigment (C) and about 5 to about 30% by weight of a luminescent amorphous pattern part (II) comprising unsaturated polyester resin (A), compound including silica (B), and luminescent pigment (D). An artificial marble according to a third embodiment includes unsaturated polyester resin (A), compound including silica (B), and amorphous luminescent chip (C).

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Uiwang-si, South Korea

Su Sun Jeong