Rohm & Haas Electronic Materials LLC

Dow Global Technolgoies LLC

Su Jin Kang

James W Thackeray

Emad Aqad

Vipul Jain

Brad C Bailey

Owendi Ongayi

D Patrick Green

A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R)&#x2550;C(R)&#x2014;O-(L)-Ar, and a calix[4]arene, wherein Rand Rare each independently a single bond, H, Calkyl, Chaloalkyl, Caryl, Chaloaryl, Caralkyl, or Chaloaralkyl, L is a Clinking group, n is 0 or 1, and Aris a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic Caromatic-containing moiety, wherein Rand Rare connected to Arwhen either or both of Rand Ris a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.

Calixarene and photoresist composition comprising same

A copolymer has formula: wherein R-Rare independently H, Calkyl, or Caryl, Ris a fluorinated or non-fluorinated Cacid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic Caryl group; each Rand Ris &#x2014;ORor &#x2014;C(CF)ORwhere each Ris H, a fluorinated or non-fluorinated Cacid decomposable group, or a combination; each Ris independently F, a Calkyl, Cfluoroalkyl, Calkoxy, or a Cfluoroalkoxy group; Ris a cation-bound Cphotoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

Photosensitive copolymer and photoresist composition

Growing community of inventors

Grafton, MA, United States of America

Su Jin Kang