Lg Innotek Co., Ltd.

Su Hyeon Cho

Dong Hyun Lee

Dong Mug Seong

Jee Heum Paik

Joo Hyun Hwang

Hae Sik Kim

Jae Seok Park

Byung Youl Moon

Tae Hoon Han

Hyo Won Son

Sang Yu Lee

Jong Min Yun

Sang Beum Lee

Yeong Deuk Jo

Nam Ho Kim

Geon Ho Roh

Jeong Ryong Lim

A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Metal plate for deposition mask, and deposition mask and manufacturing method therefor

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Seoul, South Korea

Su Hyeon Cho