Kodak Polychrome Graphics, Gmbh

Bayer Materialscience Ag

Stuart Bayes

Kevin Barry Ray

Christopher David McCullough

Carole-Anne Smith

Anthony Paul Kitson

Peter Andrew Reath Bennett

Alan Stanley Monk

Mark John Spowage

Alan Stanley Victor Monk

David Stephen Riley

James Laurence Mulligan

Gareth Rhodri Parsons

Peter Andrew Bennett

John David Riches

Richard David Hoare

John Andrew Hearson

Geoffrey Horne

Peter A R Bennett

Anthony P Kitson

Diane Cook

Kadem Gayed Al-Lamee

Martyn Peter Lott

The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.

Lithographic printing forms

Pattern formation

A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.

Method for manufacture of electronic parts

The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.

Pattern-forming methods and radiation sensitive materials

A method for preparing a printing form and a method of printing are disclosed. A coating of a radiation sensitive ink on a lithographic support having a hydrophilic surface is imaged. The unexposed areas of the coating are removed to produce a printing form, which is used for printing. Preferably, the same radiation sensitive ink is used for printing as is used in the coating, and, preferably, the desired printing run length is predetermined and the thickness of the coating determined according to the desired run length.

Lithographic plates

A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.

Pattern-forming methods

Production of water-less lithographic plates

Growing community of inventors

Leeds, United Kingdom

Stuart Bayes