Asml Netherlands B.v.

Stijn Boschker

Hans Butler

Marc Wilhelmus Maria Van Der Wijst

Cornelius Adrianus Lambertus De Hoon

Joost De Pee

Erik Roelof Loopstra

Cornelius Adrianus Lambertus Hoon De

Joost Pee De

An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.

Combination of structure and an active damping system, and a lithographic apparatus

A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

Lithographic apparatus having an active damping subassembly

An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.

Damping arrangement, active damping system, lithographic apparatus, and projection assembly

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Pijnacker, Netherlands

Stijn Boschker