Tokyo Electron Limited

Arizona Technology Innovation Group, Inc.

Steven T Fink

Eric J Strang

Wayne L Johnson

Andrej Mitrovic

Paul Moroz

Thomas H Windhorn

Maolin Long

Jay R Wallace

William Dale Jones

Paula A Calabrese

Audunn Ludviksson

Arthur H Laflamme, Jr

Sandra L Hyland

N Alan Abul-Haj

Michael Landis

Roxanne E Abul-Hal

Robert G Hostetler

A photo-bioreactor and method of operating are described. The photo-bioreactor includes a reactor vessel arranged to contain a fluid medium within which bio-material is grown, and at least one light-emitting rod extending into the reactor vessel, wherein the light-emitting rod has an elongate tubular member characterized by a length along a longitudinal axis and a width along an axis normal to the longitudinal axis, and designed with an outer wall that encloses one or more light-emitting devices arranged along the longitudinal axis, the outer wall being transparent to at least part of the light emitted by the one or more light-emitting devices into the reactor vessel. The photo-bioreactor further includes a drive system coupled to the elongate tubular member, and operatively configured to rotate the light-emitting rod about the longitudinal axis within reactor vessel, and circulate the fluid medium through the reactor.

Photo-bioreactor system and method for production of bio-materials

A photo-bioreactor system for growing and harvesting photosynthetic organisms includes an interior space partitioned into a plurality of independently controlled reactor cells, each stepped downward along a slope from a first elevation to a second elevation, and a light source coupled to each reactor cell and configured to illuminate the photosynthetic organisms with first and second light-emitting surfaces. The system includes a fluid circulation system coupled to the reactor container and configured to force a continuous flow of fluid through the cell passages.

Photo-bioreactor system and method

A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature control elements. The insulator is made from an insulting material having a lower coefficient of thermal conductivity than the base (e.g., a gas- or vacuum-filled chamber).

Thermally zoned substrate holder assembly

An apparatus for processing semiconductors includes a processing chamber including a plurality of chamber walls, a substrate holder, positioned within the processing chamber and configured to support the substrate, and a linear displacement device, coupled between a base wall of the plurality of walls and the substrate holder and configured to move the substrate holder relative to the base wall. A shielding part extending from the substrate holder to be in close parallel relation with at least one of the plurality of walls such that a first area of the processing chamber is substantially shielded from a processing environment to which the substrate is exposed.

Chuck pedestal shield

An access assembly for a process chamber, including a wall segment constructed and arranged to access the process chamber, a mounting assembly constructed and arranged to couple the wall segment to the process chamber, and a sealing plate mounted to the process chamber. The sealing plate is constructed and arranged to isolate the wall segment from a volume inside the process chamber.

Method and apparatus for removing external components from a process chamber without compromising process vacuum

The present invention presents a baffle assembly located in a plasma processing system, comprising a baffle carrier attached to the plasma processing system, and at least two baffle inserts having a plurality of passages therethrough, the at least two baffle inserts being supported by the baffle carrier.

Plasma processing system and baffle assembly for use in plasma processing system

A focus ring configured to be coupled to a substrate holder comprises a first surface exposed to a process; a second surface, opposite the first surface, for coupling to an upper surface of the substrate holder; an inner radial edge for facing a periphery of a substrate; and an outer radial edge. The second surface further comprises one or more contact features, each of which is configured to mate with one or more receiving features formed within the upper surface of the substrate holder. The focus ring can further comprise a clamping feature for mechanically clamping the focus ring to the substrate holder. Furthermore, a gas can be supplied to the contact space residing between the one or more contact features on the focus ring and the one or more receiving features on the substrate holder.

Method and apparatus for an improved focus ring in a plasma processing system

An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for making a baffle plate assembly formed from a modified baffle plate blank wherein a variety of pumping features are formed in the baffle plate blank and opened in a planar material removal operation.

Method and apparatus for improved baffle plate

A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. For example, a centering ring mounted in the substrate holder can comprise a centering feature configured to couple with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.

A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top portion with first width, a bottom portion with a second width, and sidewalls joining said top and bottom portions respectively. The tapered plug has a cross sectional profile that is substantially parallel to the top and bottom portions and a cross sectional width that varies according to a location where the cross sectional profile intersects the second axis. At least one of the tapered plugs is inserted into at least one consumable component of the substrate processing system such that the top portion of the tapered plug is exposed to a processing environment of a plasma processing system.

Method and apparatus to determine consumable part condition

A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature control elements. The insulator is made from an insulting material having a lower coefficient of thermal conductivity than the base (e.g., a gas-or vacuum-filled chamber).

This invention relates to a plasma processing system. A common problem in the manufacture of semiconductors is the maintenance of a constant fluid flow throughout the chamber in which the semiconductors are being etched. The focus ring described herein helps control fluid flow such that all (or substantially all) of a substrate (e.g., semiconductor) surface is exposed to a constant flow of plasma throughout the etching process. An even fluid flow is maintained by adjusting the configuration of a focus ring, a pumping baffle, or a focus ring working with an auxiliary focus ring with respect to the semiconductor surface. By manipulating the position of the focus ring, pumping baffle, and auxiliary focus ring, fluid flow over the surface of the semiconductor can be increased, decreased, or kept stagnant.

Plasma processing device

The present invention uses hybrid ball-lock devices as an alternate for threaded fasteners. Parts of the fastener exposed directly to the plasma act as a shield for the remaining pieces of the fastener or are used as a material to actually enhance plasma characteristics. The present invention also provides consistent electrical and mechanical contact between parts, without the use of any tools.

Hybrid ball-lock attachment apparatus

An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.

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Mesa, AZ, United States of America

Steven T Fink