Applied Materials Israel Limited

Goji Limited

Carl Zeiss Microscopy Gmbh

Dragsholm Wireless Holdings LLC

International Business Machines Corporation

Applied Materials, Inc.

Carl Zeiss Ag

Carl Zeiss Smt Gmbh

Steven Robert Rogers

Rainer K Knippelmeyer

Thomas Kemen

Daniella Atzmony

Stephan Uhlemann

Oliver Kienzle

Antonio Casares

Heiko Mueller

Eran Ben-Shmuel

Stefan Schubert

Emanuel Elyasaf

Avner Libman

Eyal Torres

Maximilian Haider

Amichai Ron

Nissim Elmaliah

Ron Naftali

Alon Litman

Alexander Libinson

Daniel Selinger

Nissim Elmaliach

Caroline Myriam Rachel Obadia

Emanuel Elyasef

Dirk Zeidler

Alexander Bilchinsky

Eric Peter Solecky

Charles Neill Archie

Elliad Silcoff

Doron Meshulach

Heiko Müller

Eliezer Gelbart

Tatiana Tania Kosoburd

Mario Muetzel

Joseph Kedmi

Koby Finkelstein

Maximillian Haider

Apparatuses, methods, kits, and systems relating to transferring electromagnetic energy to an energy application zone via a source of electromagnetic energy are disclosed. Some apparatuses may include a processor configured to determine a preliminary amount of energy to be dissipated in an object located at least partially in the energy application zone and determine a corrected amount of energy based on the preliminary amount of energy and calibration information. The processor may be further configured to estimate an amount of energy dissipated in the object. The processor may also be configured to cause the source to transfer energy to the energy application zone at least until the energy dissipated in the object as estimated equals the corrected amount of energy.

Calibrated energy transfer

A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

An apparatus configured to apply electromagnetic energy to an object may include an energy application zone adapted to receive at least a portion of an object and a source configured to supply RF energy to the energy application zone. The apparatus may also include at least one processor configured to: cause the source to supply RF energy to the energy application zone; determine a value indicative of a rate of energy absorption by a load, including at least a portion of the object, during a first period of time; and determine, based on the value indicative of the rate of energy absorption by the load, an estimated amount of time to obtain a desired characteristic in at least a portion of the object.

Time estimation for energy application in an RF energy transfer device

A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Focusing a charged particle system

The present disclosure relates to an apparatus for processing objects with RF energy. The apparatus may include a display for displaying to a user an image of an object to be processed, the image including at least a first portion and a second portion of the object. The apparatus may also include an input unit and at least one processor configured to: receive information based on input provided to the input unit; and generate, based on the received information, processing information for use in processing the object to achieve a first processing result in the first portion of the object and a second processing result in the second portion of the object.

Interface for controlling energy application apparatus

An apparatus is provided for applying electromagnetic energy to an object in an energy application zone via one or more antennas at a plurality of modulation space elements (MSEs), in which each MSE may affect a field pattern excited in the energy application zone and is controllable by the apparatus. The apparatus includes a processor that determines an amount of energy to be supplied to one or more of the antennas at each of the plurality of MSEs, select at least one power supply protocol for each of the plurality of MSEs, in which at least two of the power supply protocols selected for different MSEs differ, and cause electromagnetic power supply to one or more of the antennas in at least a subset of the plurality of MSEs, based on the determined amount of energy and based on the selected power supply protocol.

RF heating at selected power supply protocols

A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.

Charged particle multi-beam inspection system and method of operating the same

A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Focusing a charged particle imaging system

Disclosed is an apparatus for applying RF energy to an object in an energy application zone via one or more radiating elements at a plurality of modulation space elements (MSEs). The apparatus may include at least one processor configured to cause supply of RF energy to one or more of the radiating elements in a first subset of the plurality of MSEs, at a first power level common to the MSEs in the first subset and for varying time durations, and cause supply of RF energy to one or more of the radiating elements in a second subset of the plurality of MSEs, at power levels lower than the first power level and for a time duration common to the MSEs of the second subset.

A device for washing, sanitizing, and/or sterilizing an item is disclosed. The device may comprise a solution applicator for coating a surface of said item with a washing, sanitizing and/or sterilizing solution. The device may also comprise a heating unit for heating the solution coated on the surface of said item to a working temperature. The device may further comprise a control unit for keeping the temperature of the treating substance at the working temperature for a predetermined amount of time.

Device and method of sanitation and/or sterilization

Growing community of inventors

D.N. Emek Sorek, Israel

Steven Robert Rogers