University of Colorado

Other

Gm Global Technolgoy Operations, Inc.

University Technology Corporation

Drs Network & Imaging Systems, LLC

Applied Materials, Inc.

Eagle Technology, LLC

Steven McClellan George

Alan W Weimer

Jason W Klaus

John D Ferguson

Victor M Bright

Anusorn Kongkanand

Younghee Lee

Richard Daniel Noble

George Dee Skidmore

Christopher Michael Perkins

John L Falconer

Hans Heinrich Funke

Joseph J Brown

Arrelaine Allen Dameron

Paul R Lichty

Joseph Allen Spencer, Ii

Andrew S Cavanagh

Nicholas Ray Johnson

Joel W Clancey

Jarod McCormick

Jonathan Scheffe

Nathan Thomas Eigenfeld

Andrew W Ott

Jeffrey R Wank

Tukaram K Hatwar

Christos Angeletakis

Craig Metzner

Yung-Cheng Lee

Shreyas Kher

Frederick T Wagner

Ratandeep S Kukreja

Sotiris Emmanuel Pratsinis

Ofer Sneh

Anne C Dillon

Rebecca Borrelli

Jie Lian

Malcolm O'Sullivan

James Throckmorton

Karen J Buechler

Markus Daniel Groner

Ming Xie

Aziz Abdulagatov

Mattias J Young

Xiang Sun

Tyler Myers

Gongkai Wang

Alan W Weimar

Christopher A Wilson

Lee Se-Hee

Jung Yoon Seok

Layton Baker

Karen J Buochler

Nicole Marie Adamczyk Keaner

Jaime Willadean Dumont

Byunghoon Yoon

Cari F Herrmann

Yeong Kwan Kim

M Noel Rocklein

Amy Elizabeth Marquardt

Andrew Cavanaugh

Jeffrey Elam

Francois Fabreguette

Jason M Gray

Nils Hoivik

Ryan Linderman

Marie Tripp

Beau B Burton

Clinton Dutcher

David Richard Zywotko

Jonas Gertsch

Nicole Marie Adamczyk

Markus D Groner

Methods of producing an optical surface atop an exterior of a substrate that includes smoothing the exterior using an ALD process to sequentially deposit ALD layers to produce one or more ALD films that fill spaces between spaced-apart asperities existing on the exterior, and thereafter depositing a reflective material on the smoothed exterior of the substrate to produce the optical surface. The smoothing resulting from depositing the ALD film on the exterior of the substrate causes the grain size of the reflective material to be reduced in comparison to the grain size that would exists without having deposited the ALD film on the exterior of the substrate. The smoothing is sufficient to cause a reduction in grain size that results in a reduction in plasmon absorption in the optical surface in comparison to the plasmon absorption that would otherwise exist without having reduced the grain size of the reflective material.

Smoothing surface roughness using atomic layer deposition

The present invention relates to the unexpected discovery of novel methods of preparing nanodevices and/or microdevices with predetermined patterns. In one aspect, the methods of the invention allow for engineering structures and films with continuous thickness equal to or less than 50 nm.

Atomic layer etching on microdevices and nanodevices

The invention includes a method of promoting atomic layer etching (ALE) of a surface. In certain embodiments, the method comprises sequential reactions with a metal precursor and a halogen-containing gas. In other embodiments, the etching rate is increased by removing residual species bound to and/or adsorbed onto the surface.

Enhancement of thermal atomic layer etching

The invention includes a method of promoting atomic layer etching (ALE) of a surface. In certain embodiments, the method comprises sequential reactions with a metal precursor and a halogen-containing gas. The invention provides a solid substrate obtained according to any of the methods of the invention. The invention further provides a porous substrate obtained according to any of the methods of the invention. The invention further provides a patterned solid substrate obtained according to any of the methods of the invention.

Methods of atomic layer etching (ALE) using sequential, self-limiting thermal reactions

The invention includes a method of promoting thin film growth on a solid substrate, wherein derivatization of the substrate comprises formation of at least one surface species. In certain embodiments, the method comprises desorbing the surface species from the substrate using electron stimulated desorption (ESD).

Methods of growing thin films at low temperatures using electron stimulated desorption (ESD)

The invention includes a method of promoting atomic layer etching (ALE) of a surface. In certain embodiments, the method comprises contacting a solid substrate comprising a first metal compound with an oxidant, optionally contacting the solid substrate with a second metal compound, and then contacting the modified solid substrate with a fluorinating agent, whereby ALE of the solid substrate is promoted.

Atomic layer etching processes using sequential, self-limiting thermal reactions comprising oxidation and fluorination

A method for forming a corrosion-resistant catalyst for fuel cell catalyst layers is provided. The method includes a step of depositing a conformal Pt or platinum alloy thin layer on NbOsubstrate particles to form Pt-coated NbO. The Pt-coated NbOparticles are then incorporated into a fuel cell catalyst layer.

Corrosion-resistant catalyst

Ultrathin layers of organic polymers or organic-inorganic hybrid polymers are deposited onto a substrate using molecular layer deposition methods. The process uses vapor phase materials which contain a first functional group and react only monofunctionally at the surface to add a unit to the polymer chain. The vapor phase reactant in addition has a second functional group, which is different from the first functional group, or a blocked, masked or protected functional group, or else has a precursor to such a functional group.

Molecular layer deposition process for making organic or organic-inorganic polymers

A coated substrate for forming fuel cell catalyst layers includes a plurality of substrate particles, an adhesion layer disposed over the substrate particles, and a precious metal layer disposed over the adhesion layer. The substrate particles may be carbon powders, carbon nanorods, carbon nanotubes and combinations thereof; with a preferred aspect ratio from 10:1 to 25:1. The adhesion layer includes a tungsten metal layer and may be formed into a heterogeneous layer comprising a lattice-interrupting layer interposed between two tungsten metal layers. The lattice-interrupting layer reduces mechanical stress to the adhesion layer with extended thickness that may develop when it experiences changing environments, and can be any layer other than the metal layer, for example, AlO, Al, or WO, where x is 1.5 to 3.0. Characteristically, the coated substrate is used in fuel cell applications such as providing the catalyst particles used in the cathode and/or anode catalyst layers.

Conformal thin film of precious metal on a support

The present invention relates to novel nano- and micro-electromechanical devices and novel methods of preparing them. In one aspect, the invention includes methods of preparing a nanodevice. In certain embodiments, the methods comprise coating a polymer layer with a first at least one thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated layer. In other embodiments, the methods comprise patterning the first at least one thin solid material layer to form a nanodevice. In yet other embodiments, the methods comprise releasing the nanodevice from the polymer layer.

Methods of preparing nanodevices

Coatings are applied on a flexible substrate using atomic layer deposition and molecular layer deposition methods. The coatings have thickness of up to 100 nanometers. The coatings include layers of an inorganic material such as alumina, which are separated by flexibilizing layers that are deposited with covalent chemical linkage to the inorganic material and which are one or more of silica deposited by an atomic layer deposition process; an organic polymer that is deposited by a molecular layer deposition process, or a hybrid organic-inorganic polymer that is deposited by an molecular layer deposition process.

Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques

Supercapacitors have composite electrodes that include a porous carbonaceous material such as graphene onto which a metal oxide pseudocapacitor material is deposited in the form of nano-scale particles or a nano-scale film. The composite electrodes exhibit excellent specific capacitance, even at high scan rates.

Supercapacitor devices formed by depositing metal oxide materials onto carbon substrates

Inorganic materials are deposited onto organic polymers using ALD methods. Ultrathin, conformal coatings of the inorganic materials can be made in this manner. The coated organic polymers can be used as barrier materials, as nanocomposites, as catalyst supports, in semiconductor applications, in coating applications as well as in other applications.

Method of depositing an inorganic film on an organic polymer

Electrodes for lithium batteries are coated via an atomic layer deposition process. The coatings can be applied to the assembled electrodes, or in some cases to particles of electrode material prior to assembling the particles into an electrode. The coatings can be as thin as 2 &#x212b;ngstroms thick. The coating provides for a stable electrode. Batteries containing the electrodes tend to exhibit high cycling capacities.

Lithium battery electrodes with ultra-thin alumina coatings

A method to achieve a conformal ultrathin film of platinum or one of its alloys on a substrate that can be economically used as a heterogeneous catalyst, such as automotive polymer electrolyte membrane (PEM) fuel cell catalyst. The method includes using a hydrogen plasma in platinum atomic layer deposition along with tungsten as a substrate or anchoring adhesive layer to assist platinum nucleation and deposition.

Nucleation of ultrathin, continuous, conformal metal films using atomic layer deposition and application as fuel cell catalysts

Growing community of inventors

Boulder, CO, United States of America

Steven McClellan George