International Business Machines Corporation

Steven L Bard

Jeffrey D Jones

Robert H Katyl

Ronald J Moore

John J Glenning

Oscar A Moreno

Gareth Geoffrey Hougham

Claudius Feger

Peter Slota, Jr

John J Ritsko

Steven E Molis

Michael J Canestaro

James Steven Kamperman

Randy William Snyder

Walter P Pawlowski

Jack M McCreary

Gerald A Bendz

Edward Jay Frankoski

Michael S Horan

John R Chapura

David N Christensen

John R Kjelgaard, Jr

James A Nicoletti

Mark W Urdanick

A new apparatus for treating substrates with fluids, as well as a corresponding fluid treatment method, is disclosed. The new apparatus includes a new configuration of fluid jet injectors which substantially overcomes the problem of dragout, in which fluid impinged upon an area of a substrate is retained on that area, preventing fresh fluid from reaching the impinged area. This new configuration also avoids imposing torques on substrates, and substantially reduces the need for rollers and guides for transporting substrates.

Fluid treatment apparatus and method

A fluid treatment apparatus and method for applying first and second fluids (e.g., etchant and water) to an article (e.g., circuit board) passing through the apparatus at a predetermined rate. The first fluid is impinged on a surface of the article and thereafter collected within the apparatus' common housing. The second fluid is impinged onto the surface of the article and collected within the same housing but at a location separate from the collected first fluid so as to at least partially prevent mixing thereof. The preferred means for effecting fluid impingement comprises separate fluid injecters, each including at least two rows of fluid jet injectors therein. The collected fluids are each returned to the respective impingement means. Replenishment of the second fluid is accomplished using a pump which supplies the second fluid, while the apparatus also includes means (e.g., a drain) to effectively remove the second fluid at a rate similar to the supply rate for the second fluid. The first fluid is also maintained at an established level above the article's surface using suitable means (e.g., dual rollers) located relative (e.g., on opposite sides of) the first fluid impingement means. Similar level retention for the second fluid is also possible. Cascading of the collected second fluid is also defined, this occurring within the same housing chamber which serves to collect the first fluid.

Fluid treatment apparatus

A fluid treatment apparatus and method wherein uniform treatment of a substrate (e.g., a thin, metallic sheet) is treated (e.g., etched) during movement thereof. This treatment involves directing a plurality of fluid jets through a collected first fluid onto one of the substrate's surfaces in such a manner that the fluid of each fluid jet will engage (collide with) the fluid from the nearest fluid jet as a result of being maintained across the substrate's surface at a predetermined velocity prior to mixing of the jets with surrounding fluid. Prevention of such mixing prior to such engagement has proven to assure uniform treatment of the substrate. In one aspect of the invention, fluid is directed onto opposite surfaces of the substrate in this fashion, the fluid from the lower surface, however, being passed through air or similar ambient and thus prevented from mixing therewith prior to such engagement.

A device for applying fluid (e.g., etchant) to a substrate (e.g., thin metallic tape) wherein the device includes a head member having means therein for directing a first fluid (e.g., etchant) at an established first pressure against the substrate and means for directing a second fluid (e.g., air) at an established second pressure equal to or greater than the first pressure (at the location of fluid intersection) and against the substrate in the area proximate the first fluid so as to substantially contain and limit the first fluid to impingement substantially only at the location against which the first fluid is designed to strike. Preferably, two opposing head members are utilized, and these may serve to maintain the substrate therebetween in a suspended state. Both head members are movable relative to each other during fluid application. As stated, the device is particularly suited to function as an etcher, but may also serve other purposes (e.g., coating, cleaning, rinsing, etc.).

Fluid treatment device

Polyimide is etched by contacting the polyimide with an aqueous solution of a metal hydroxide followed by contact with an acid followed by contact with an aqueous solution of a metal hydroxide. Etching of chemically cured polyimide can be enhanced by employing a presoaking in hot water. Also, partially etched chemically cured polyimide is removed with a concentrated acid solution. In preparing a metal coated polyimide structure for subsequent gold plating, two flash etching steps with the polyimide etch between are employed after developing the photoresist.

Wet etching of thermally or chemically cured polyimide

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Endwell, NY, United States of America

Steven L Bard