Euv Llc.

University of California

The United States of America As Represented by the United States

Sandia National Laboratories

Steven Julian Haney

Donald Joe Herron

Leonard Elliott Klebanoff

William C Replogle

Daniel A Tichenor

William C Sweatt

Scot S Olivier

Donald W Sweeney

Brian J Bauman

Glenn D Kubiak

Richard H Stulen

Charles A Thompson

Michael E Malinowski

Don T Gavel

Abdul A S Awwal

Norman F Toly

Stephen K Eisenbies

Stephen Eisenbies

Steve M Jones

A system for improving vision that can diagnose monochromatic aberrations within a subject's eyes, apply the wavefront correction, and then enable the patient to view the results of the correction. The system utilizes a laser for producing a beam of light; a corrector; a wavefront sensor; a testing unit; an optic device for directing the beam of light to the corrector, to the retina, from the retina to the wavefront sensor, and to the testing unit; and a computer operatively connected to the wavefront sensor and the corrector.

Adaptive ophthalmologic system

The present invention provides a two-piece apparatus for holding and aligning the MEMS deformable mirror. The two-piece apparatus comprises a holding plate for fixedly holding an adaptive optics element in an overall optical system and a base spatially fixed with respect to the optical system and adapted for mounting and containing the holding plate. The invention further relates to a means for configuring the holding plate through adjustments to each of a number of off-set pads touching each of three orthogonal plane surfaces on the base, wherein through the adjustments the orientation of the holding plate, and the adaptive optics element attached thereto, can be aligned with respect to the optical system with six degrees of freedom when aligning the plane surface of the optical element. The mounting system thus described also enables an operator to repeatedly remove and restore the adaptive element in the optical system without the need to realign the system once that element has been aligned.

System and method for reproducibly mounting an optical element

A portable device for detecting surface outgas contaminants of an article includes: (i) a portable housing that has a chamber which is in communication with a port that is adapted to be sealably attached to a surface of the article; (ii) a mass spectrometer that is coupled to the chamber for analyzing gaseous materials in the chamber; and (iii) means for generating a vacuum within the chamber thereby drawing outgas contaminants from the surface of the article into the chamber for analysis by the mass spectrometer. By performing a mass spectrometric analysis of the surface of interest and comparing the data with mass spectrometric data ascertained with the device from a clean surface, the type and amount of outgas contaminants, if any, can be determined.

Portable outgas detection apparatus

A modified beam splitter that has a hole pattern that is symmetric in one axis and anti-symmetric in the other can be employed in a mask-to-wafer alignment device. The device is particularly suited for rough alignment using visible light. The modified beam splitter transmits and reflects light from a source of electromagnetic radiation and it includes a substrate that has a first surface facing the source of electromagnetic radiation and second surface that is reflective of said electromagnetic radiation. The substrate defines a hole pattern about a central line of the substrate. In operation, an input beam from a camera is directed toward the modified beam splitter and the light from the camera that passes through the holes illuminates the reticle on the wafer. The light beam from the camera also projects an image of a corresponding reticle pattern that is formed on the mask surface of the that is positioned downstream from the camera. Alignment can be accomplished by detecting the radiation that is reflected from the second surface of the modified beam splitter since the reflected radiation contains both the image of the pattern from the mask and a corresponding pattern on the wafer.

Mask-to-wafer alignment system

A compact, vacuum compatible motorized jack for supporting heavy loads and adjusting their positions is provided. The motorized jack includes: (a) a housing having a base; (b) a first roller device that provides a first slidable surface and that is secured to the base; (c) a second roller device that provides a second slidable surface and that has an upper surface; (d) a wedge that is slidably positioned between the first roller device and the second roller device so that the wedge is in contact with the first slidable surface and the second slidable surface; (e) a motor; and (d) a drive mechanism that connects the motor and the wedge to cause the motor to controllably move the wedge forwards or backwards. Individual motorized jacks can support and lift of an object at an angle. Two or more motorized jacks can provide tip, tilt and vertical position adjustment capabilities.

Motorized support jack

Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

Extreme-UV lithography vacuum chamber zone seal

An apparatus and method for in-situ cleaning of resist outgassing windows. The apparatus includes a chamber located in a structure, with the chamber having an outgassing window to be cleaned positioned in alignment with a slot in the chamber, whereby radiation energy passes through the window, the chamber, and the slot onto a resist-coated wafer mounted in the structure. The chamber is connected to a gas supply and the structure is connected to a vacuum pump. Within the chamber are two cylindrical sector electrodes and a filament is electrically connected to one sector electrode and a power supply. In a first cleaning method the sector electrodes are maintained at the same voltage, the filament is unheated, the chamber is filled with argon (Ar) gas under pressure, and the window is maintained at a zero voltage, whereby Ar ions are accelerated onto the window surface, sputtering away carbon deposits that build up as a result of resist outgassing. A second cleaning method is similar except oxygen gas (O,) is admitted to the chamber instead of Ar. These two methods can be carried out during lithographic operation. A third method, carried out during a maintenance period, involves admitting CO,into the chamber, heating the filament to a point of thermionic emission, the sector electrodes are at different voltages, excited CO,gas molecules are created which impact the carbon contamination on the window, and gasify it, producing CO gaseous products that are pumped away.

Apparatus and method for in-situ cleaning of resist outgassing windows

An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

Extreme ultraviolet lithography machine

A manipulator for rotatably moving a test specimen in an ultra-high vacuum chamber includes a translational unit movable in three mutually perpendicular directions. A manipulator frame is rigidly secured to the translational unit for rotatably supporting a rotary shaft. A first copper disc is rigidly secured to an end of the rotary shaft for rotary movement within the vacuum chamber. A second copper disc is supported upon the first disc. The second disc receives a cryogenic cold head and does not rotate with the first disc. A sapphire plate is interposed between the first and second discs to prevent galling of the copper material while maintaining high thermal conductivity between the first and second discs. A spring is disposed on the shaft to urge the second disc toward the first disc and compressingly engage the interposed sapphire plate. A specimen mount is secured to the first disc for rotation within the vacuum chamber. The specimen maintains high thermal conductivity with the second disc receiving the cryogenic transfer line.

Growing community of inventors

Tracy, CA, United States of America

Steven Julian Haney