Promerus, Lcc

Merck Patent Gmbh

Sumitomo Bakelite Company Limited

Steven J Smith

Larry Funderburk Rhodes

Pramod Kandanarachchi

Kazuyoshi Fujita

Andrew Bell

Edmund Elce

Hendra Ng

Pawel Miskiewicz

Toby Cull

Miguel Carrasco-Orozco

Piotr Wierzchowiec

David Christoph Müller

David Christoph Mueller

Hugh A Burgoon

Chun S Chang

Patrick Bradley

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.

Gate insulator layer for organic electronic devices

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

Interlayer for electronic devices

Embodiments in accordance with the present invention encompass water soluble polycyclic vinyl addition polymers having a norbornene type repeat unit derived from a norbornene type of monomer that encompasses a saccharide functional moiety. Embodiments in accordance with the present invention also encompass low and high molecular weight polymers with low catalyst loading.

Water soluble norbornene-type polymers and photoimageable compositions thereof

Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.

Norbornene-type polymers, compositions thereof and lithographic process using such compositions

A method of controlling the molecular weight of poly(cyclic)olefin (norbornene-type) polymers and activating the polymerization thereof with a single material is provided. Such method include adding a chain transfer/activating agent to a mixture of monomer(s), catalyst, solvent and an optional cocatalyst and polymerizing the mixture to form a polymer. It is shown that the amount of chain transfer/activating agent in the mixture can serve to control the molecular weight of the resulting polymer, its percent conversion or both, and in some embodiments the optical density of the resulting polymer.

Use of a combination chain transfer and activating agent to control molecular weight and optical density of Pd catalyzed norbornene polymers

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Brecksville, OH, United States of America

Steven J Smith