Pilkington Group Limited

Libbey-owens-ford Co.

Steven Edward Phillips

Douglas Martin Nelson

Michael Martin Radtke

A method of depositing a coating utilizing a coating apparatus includes providing a coating apparatus above a glass substrate and forming a coating on a surface of the glass substrate while flowing a fluorine-containing compound into the coating apparatus. The fluorine-containing compound inhibits the formation of the coating on one or more portions of the coating apparatus.

Method of depositing a coating utilizing a coating apparatus

A CVD process for depositing a silica coating is provided. The process includes providing a float glass ribbon in a float glass manufacturing process. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger. The gaseous mixture is directed toward and along the float glass ribbon and is reacted over the float glass ribbon to form the silica coating thereon. The silica coating comprises silicon dioxide.

Chemical vapor deposition process for depositing a silica coating on a glass substrate

A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.

The invention is a method of making a coated glass substrate having a low haze. A soda-lime glass substrate having at least one surface upon which a coating may be deposited is provided. The glass substrate is heated and maintained at a temperature sufficient to volatilize salts that may be formed during the depositing of a first coating on the glass substrate. A first gaseous precursor mixture including a halogen containing precursor, a metal precursor, an oxidizing agent, and an inert to carrier gas is directed toward and along the surface to be coated and reacting the mixture at or near the surface of the glass substrate to form a first coating containing a metal oxide coating. The glass substrate is cooled to a temperature to reduce crystalline growth in a second coating to be applied over the first coating. A second gaseous precursor mixture including a second metal precursor, an oxidizing agent, and an inert carrier gas is directed toward and along the coated surface of the glass substrate and reacting the mixture at or near the coated surface to form a metal containing coating. The glass substrate is cooled to an ambient temperature. The invention also includes a coated glass substrate produced in accordance with the aforementioned method.

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Ottawa, IL, United States of America

Steven Edward Phillips