Allnex Belgium S.a.

Cytec Surface Specialties, S.a.

Allnex Resins (shanghai) Co., Ltd.

Allnex Austria Gmbh

Steven Cappelle

Hugues Van Den Bergen

Michel Tielemans

Paul Gevaert

Ram Baboo Gupta

Stephan Peeters

Luc Boogaerts

Dong Chen

Rong Chen

Johann Billiani

Jurgen Van Holen

Luc Lindekens

Elodie Siband

Robert Potzmann

Luc De Waele

Lieven Depuydt

Guido Vanmeulder

Xavier Deruyttere

Xie Cheng

Peter Burie

Benoit De Becker

Kevin Poelmans

Paulo Vieira

Jose Remacle

The present invention provides a radiation curable composition comprising a hydroxyl functional urethane (meth)acrylate compound (A) having an hydroxyl value between 10 and 80 mg KOH/g and which is the reaction product of a hydroxyl functional (meth)acrylate compound (A1) obtained from the reaction a or b: a. at least one diepoxy functional compound (A11a) with a (meth)acrylate compound (A11b) comprising at least one (meth)acrylate group and one carboxylic acid functional group or b. a carboxylic acid functional compound (A12a) comprising two carboxylic acid groups with an epoxy (meth)acrylate compound (A12b) comprising one glycidyl group and at least one (meth)acrylate group, with a diisocyanate functional compound (A3), and optionally a compound (A2) different of compound (A1) comprising two hydroxyl groups. Such composition is useful for example for dual curable compositions or for thick pigmented systems.

Radiation curable composition

The present invention generally relates to the field of radiation curable compositions comprising (meth)acrylated acrylic polymers comprising pendant hydroxyl groups, methods for making these radiation curable compositions and their uses.

The radiation curable compositions (I) that comprise from 10 to 80 by weight of at least one silicone-modified urethane (meth) acrylate (A), from 0.5 to 60 by weight of at least one (meth) acrylated compound (B) bearing at least 5 (meth) acryloyl groups per molecule, and optionally, from 10 to 60% by weight of at least one compound (C) different from (A) or (B), wherein the weight percentages are on the total weight of the composition (I). These materials can be used for producing coatings, inks and overprint varnishes with excellent anti-stain properties, to their use and preparation. Materials of the invention are compatible with standard radiation curable materials. They allow to obtain excellent anti-stain properties for high gloss coatings as well as for matte coatings (II) with a gloss level at 60&#xb0; of at most 15, even at most 10.

Radiation curable compositions with anti-stain properties

The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on &#x2014;at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, &#x2014;at least one acidic compound (ii) having a pKa between 1 and 3, and &#x2014;at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on &#x2014;at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, &#x2014;at least one compound (iv) selected from the group consisting of spirophosphites, and &#x2014;optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.

Stabilizer for thiol-ene compositions

An aqueous dispersion comprising a mixture of a first dispersion and a second dispersion, wherein the first dispersion comprises at least one (meth)acrylated pre-polymer (A), and the second dispersion comprises at least one thiol-functional compound (B). The aqueous dispersion optionally comprises at least one ethylenically unsaturated compound (C).

Radiation curable aqueous dispersions

The present invention relates to radiation curable compositions (A) comprising&#x2014;(a) at least one photoinitiator compound of formula (I) wherein Q is the residue of a hydroxy compound having 1 to 6 hydroxyl groups, and wherein x is a number that is at least 1 but no greater than the number of hydroxyl groups originally present in said hydroxy compound;&#x2014;(b) at least one ethylenically unsaturated compound selected from monomers (b1) and/or from oligomers (b2); and&#x2014;(c) optionally, at least one co-synergist which preferably is an amino co-synergist. The present invention further relates to photoinitiator compounds(a) and their preparation. 

Polymeric photoinitiators

A compound obtained by reaction of one or more amines of general formula NHRRwith a benzophenone derivative of the following general formula (IX) wherein

Photo-reactive binder

A compound obtained by reaction of one or more amines of the general formula NHRRwith a compound of the following general formula (IX): wherein,

Amino photo-reactive binder

The present invention relates to an aqueous composition comprising from 5 to 90% by weight of a polymerizable ethylenically unsaturated water dispersible polyurethane (A) and from 1 to 60% by weight relative to the weight of polyurethane (A) of a least one polymerizable ethylenically unsaturated compound (B) having a water solubility at 25&#xb0; C. of less than 50 g/l, and it use for making high gloss coatings as well as wood stains.

Aqueous radiation curable polyurethane compositions

A process for preparing a substrate having thereon sites reactive with the reactive groups of a molecular probe, the process comprising the steps of applying to the substrate surface a material comprising one or more reactive sites having an activated ethylenically unsaturated double bond of the formula I: wherein the substituents are defined in the specification and, in a further step, covalently binding the reactive group of the molecular probe to the activated ethylenically unsaturated double bond of the reactive sites having formula I.

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Ninove, Belgium

Steven Cappelle