Fei Comapny

Crystal Is, Inc.

Steven Berger

Colin Sanford

Bart Buijsse

Cornelis Sander Kooijman

Hendrik Gezinus Tappel

Sander Richard Marie Stoks

Hugo Van Leeuwen

Ben Jacobus Marie Bormans

Koen Arnoldus Wilhelmus Driessen

Diane Stewart

Martinus Petrus Maria Bierhoff

Christian R Musil

Joan Williams Casey, Legal Representative

John Beaty

Leo J Schowalter

J David Casey, Jr

Rajul Randive

Johannes Antonius Hendricus W G Persoon

Johannes Antonius Hendricus Wilhelmus Gerardus Persoon

Mart Petrus Maria Bierhoff

Sybren J Sijbrandij

Johannes Antonius Hendricus Wg Persoon

Colin August Sanford

Johannes Antonius Hendricus WG Persoon

Johannes AHWG Persoon

Johannes Antonius Hendricus Wilhelmus G Persoon

Diane K Stewart

A system for disinfecting fluid includes a plurality of fluid reactors. Each of the fluid reactors includes at least one UVC LED. The UVC LED includes an LED chip configured to emit UVC radiation and a package coupled with the LED chip. The LED chip has a top surface that defines a chip top surface area. The top surface is formed from a semiconductor material having an index of refraction. The fluid reactor has at least one wall that defines a chamber configured to contain the fluid. The at least one wall has an aperture configured to receive UVC radiation into the chamber. The aperture extends through the at least one wall. The aperture has an aperture area that is (1) smaller than a top surface area of the package and (2) equal to or larger than the chip top surface area.

Fluid treatment reactor

A system for disinfecting fluid includes a UVC LED. The UVC LED includes an LED chip configured to emit UVC radiation and a package coupled with the LED chip. The LED chip has a top surface that defines a chip top surface area. The top surface is formed from a semiconductor material having an index of refraction. The fluid reactor has at least one wall that defines a chamber configured to contain the fluid. The at least one wall has an aperture configured to receive UVC radiation into the chamber. The aperture extends through the at least one wall. The aperture has an aperture area that is (1) smaller than a top surface area of the package and (2) equal to or larger than the chip top surface area.

A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively.

User interface for an electron microscope

A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

Compact scanning electron microscope

An improved simulator for an analytical instrument that provides the student with an experience similar to that of operating the actual instrument. In one preferred embodiment, the invention combines real functionality and simulated functionality where at least one function of the analytical instrument is real. In another preferred embodiment, the invention combines a functional first instrument along with a simulation of a second instrument, the simulation including both hardware with limited functionality and software that simulates the output of a functional instrument to create a teaching aid for use in classrooms and teaching laboratories.

Combined hardware and software instrument simulator for use as a teaching aid

Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.

Electron beam processing for mask repair

Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle.

Photolithography mask repair

Growing community of inventors

Newburyport, MA, United States of America

Steven Berger