H.c. Starck Gmbh

Starmet Corporation

Raytheon Company

H.c. Starck Solutions Euclid, LLC

Hans Keller

Steven Alfred Miller

Uwe Papp

Stefan Zimmermann

Prabhat Kumar

Leonid Natan Shekhter

Gary Alan Rozak

Mark E Gaydos

Scott Jeffrey Volchko

Richard Wu

Joseph Hirt

David Meendering

James G Daily, Iii

Jerome O'Grady

William Loewenthal

Brad Lemon

Timothy Welling

Shuwei Sun

Rong-Chein Richard Wu

Rong-chein Richard Wu

Stefan Zimmerman

Olaf Schmidt-Park

Peter R Jepson

Matthew D Stephens

Jessica Belcher

David G Schwartz

Gokce Gulsoy

Michael Thomas Stawovy

Francois-Charles Dary

Leah F Haywiser

Paul R Aimone

Kirk A Miller

Jason R Lavine

Howard V Goldberg

Richard L Scott

Lyale F Marr

Henning Uhlenhut

Walter W Norman

Christopher J Baker

Norman C Mills

David G Schwarz

Davd G Schwarz

Henry J DeMita

Elizabeth S Goodwin

Charles Wood

Glen Zeman

Charles B Wood

James G Iii Daily

Jerone O´Grady

An apparatus includes a deformable mirror. The deformable mirror includes a reflective surface configured to reflect a high-energy laser (HEL) beam and to focus the HEL beam on a target. The deformable mirror also includes multiple actuators configured to adjust a shape of the reflective surface in order to maintain focus of the HEL beam on the target over a specified range of distances between the deformable mirror and the target. At least one portion of the reflective surface is configured to be adjusted by the actuators and obtain convex, flat, and concave shapes.

Catoptric focus mechanisms for high-energy laser (HEL) systems

In various embodiments, eroded sputtering targets are partially refurbished by spray-depositing particles of target material to at least partially fill certain regions (e.g., regions of deepest erosion) without spray-deposition within other eroded regions (e.g., regions of less erosion). The partially refurbished sputtering targets may be sputtered after the partial refurbishment without substantive changes in sputtering properties (e.g., sputtering rate) and/or properties of the sputtered films.

Partial spray refurbishment of sputtering targets

A light sensor system including a reference light source that moves in unison with a primary mirror and/or an inertial measurement device, and/or the reference light source is directed toward an obscured region of the light sensor system. The reference light source may allow for improved jitter compensation based on feedback of the reference light. The feedback may be representative of the elastic deformation of the optics and telescope optical axis. The improved jitter compensation may allow for the light sensor system (e.g., the housing and/or mirrors) to be built with less stiff materials, which can reduce the cost of manufacturing the present light sensor system compared to previously known optical sensor systems. In cases of high vibration levels which would otherwise degrade the resulting image quality after material stiffness property selections have been exhausted, the light sensor system may provide jitter compensation to improve video or still image quality.

Automatic structurally induced line of sight jitter compensation for electro-optical/infrared turret system

A warm shield as part of a thermal imaging system comprising a reflecting surface having a convex curvature that when positioned relative to an opening of a thermal imaging system, thermal energy originating from the opening of the thermal imaging system incident on the convex curvature is reflected in a direction away from the opening of the thermal imaging system. An aperture can be formed in the reflecting surface and positioned to facilitate passage therethrough of external thermal energy in a direction towards a detector of the thermal imaging system, and passage of at least some of the thermal energy originating from within the thermal imaging system in a direction away from the thermal imaging system.

Convex warm shield for thermal imaging device

In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.

Methods of forming molybdenum sputtering targets

In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.

Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom

In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.

Methods of manufacturing large-area sputtering targets using interlocking joints

Large-area sputtering targets

In various embodiments, tubular sputtering targets comprising molybdenum are provided and sputtered to produce thin films comprising molybdenum. The sputtering targets may be formed by forming a tubular billet having an inner diameter IDand an outer diameter OD, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet having an outer diameter ODsmaller than OD, and heat treating the worked billet. The sputtering targets may have a substantially uniform texture of (a) a 110 orientation parallel to a longitudinal direction and (b) a 111 orientation parallel to a radial direction.

Methods of depositing thin films using molybdenum sputtering targets

Methods of manufacturing large-area sputtering targets

Growing community of inventors

Canton, MA, United States of America

Steven Alfred Miller